| Presentation | 2005-01-27 High-resolution failure analysis with SIL plate Takeshi Yoshida, Tohru Koyama, Junko Komori, Yoji Masiko, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We developped FOSSIL (Forming Si Substrate into SIL (Solid Immersion Lens)) technique that realized theoritical spatial resolution and detection performance as SIL by directly forming the Silicon in 2002. However there is restriction that a viewpoint is fixed with FOSSIL, this time, we developed SIL plate that enables to move viewpoint. SIL plate can be applied with wafer sample which is impossible for conventional SIL without changing equipment composition. About detection performance, we confiremed that spatial resolution of SIL plate less than that of FOSSIL, but SIL plate can realize transistor level analysis for devices of the 90nm node. This technique is promising as practical SIL technique that is easily applicable. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Emission analysis / OBIRCH analysis / SIL(Solid Immersion Lens) / Resolution |
| Paper # | CPM2004-157,ICD2004-202 |
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| Conference Information | |
| Committee | CPM |
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| Conference Date | 2005/1/20(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
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| Paper Information | |
| Registration To | Component Parts and Materials (CPM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | High-resolution failure analysis with SIL plate |
| Sub Title (in English) | |
| Keyword(1) | Emission analysis |
| Keyword(2) | OBIRCH analysis |
| Keyword(3) | SIL(Solid Immersion Lens) |
| Keyword(4) | Resolution |
| 1st Author's Name | Takeshi Yoshida |
| 1st Author's Affiliation | Process & Device Analysis Enginnering Development LSI Manufactureing Technology Unit, Renesas Technology() |
| 2nd Author's Name | Tohru Koyama |
| 2nd Author's Affiliation | Process & Device Analysis Enginnering Development LSI Manufactureing Technology Unit, Renesas Technology |
| 3rd Author's Name | Junko Komori |
| 3rd Author's Affiliation | Process & Device Analysis Enginnering Development LSI Manufactureing Technology Unit, Renesas Technology |
| 4th Author's Name | Yoji Masiko |
| 4th Author's Affiliation | Process & Device Analysis Enginnering Development LSI Manufactureing Technology Unit, Renesas Technology |
| Date | 2005-01-27 |
| Paper # | CPM2004-157,ICD2004-202 |
| Volume (vol) | vol.104 |
| Number (no) | 626 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |