Presentation | 2005-01-27 Evaluation of LVP observability in 90nm devices, and development of on-chip elements for LVP measurement Junpei Nonaka, Shinichi Wada, |
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Abstract(in English) | For devices after 90nm generation, LVP measurement will be difficult, because transistor sizes are less than laser diffraction limited. In this study, we evaluated ease of LVP measurement for 90nm devices. We also considered relationship between voltage waveforms and LVP waveforms through LVP measurement and device simulation. For devices after 90nm, inserting on-chip elements for LVP measurement into circuit will ease LVP measurement. We propose a new element structure to ease LVP measurement, and evaluate it. As a result, LVP waveform amplitudes for the elements are 30-50% larger than those for the same size inverters. Ease of LVP measurement is improved by using the proposed structure. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | LVP / 90nm / device simulation / observability / pad |
Paper # | CPM2004-156,ICD2004-201 |
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Committee | CPM |
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Conference Date | 2005/1/20(1days) |
Place (in Japanese) | (See Japanese page) |
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Registration To | Component Parts and Materials (CPM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Evaluation of LVP observability in 90nm devices, and development of on-chip elements for LVP measurement |
Sub Title (in English) | |
Keyword(1) | LVP |
Keyword(2) | 90nm |
Keyword(3) | device simulation |
Keyword(4) | observability |
Keyword(5) | pad |
1st Author's Name | Junpei Nonaka |
1st Author's Affiliation | Test Analysis Technology Development Division, NEC Electronics Corporation() |
2nd Author's Name | Shinichi Wada |
2nd Author's Affiliation | Test Analysis Technology Development Division, NEC Electronics Corporation |
Date | 2005-01-27 |
Paper # | CPM2004-156,ICD2004-201 |
Volume (vol) | vol.104 |
Number (no) | 626 |
Page | pp.pp.- |
#Pages | 6 |
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