Presentation | 2004/11/4 Resist-removal technique without plasma using hydrogen atoms generated on heated catalyzer Atsushi MASUDA, Kouhei HASHIMOTO, Kazuhisa TAKAO, Tomoatsu ISHIBASHI, Hideki MATSUMURA, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Resist-removal technique without plasma using high-density hydrogen atoms generated on heated catalyzer is introduced. Both no plasma damage and no oxidation for the substrate under the resist are advantages of this process in comparison with the conventional oxygen plasma ashing. However, slow removal rate had been a problem to be solved. In this study, hydrogen flow rate, hydrogen pressure, catalyzer temperature, wafer-stage temperature and distance between catalyzer and wafer were widely changed and resist-removal rate faster than 1 μm/min was realized in the optimized condition. This removal rate should be applicable level in industry. Concentration of tungsten on wafer, possibly evaporated from the catalyzer, was estimated to be the first half of 10^<10> cm^<-2>, which brings about no problem for industrial application. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Resist removal / Heated catalyzer / Hydrogen atoms / Plasmaless process |
Paper # | CPM2004-134 |
Date of Issue |
Conference Information | |
Committee | CPM |
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Conference Date | 2004/11/4(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Component Parts and Materials (CPM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Resist-removal technique without plasma using hydrogen atoms generated on heated catalyzer |
Sub Title (in English) | |
Keyword(1) | Resist removal |
Keyword(2) | Heated catalyzer |
Keyword(3) | Hydrogen atoms |
Keyword(4) | Plasmaless process |
1st Author's Name | Atsushi MASUDA |
1st Author's Affiliation | School of Materials Science, Japan Advanced Institute of Science and Technology() |
2nd Author's Name | Kouhei HASHIMOTO |
2nd Author's Affiliation | School of Materials Science, Japan Advanced Institute of Science and Technology |
3rd Author's Name | Kazuhisa TAKAO |
3rd Author's Affiliation | Tokyo Ohka Kogyo Co., Ltd. |
4th Author's Name | Tomoatsu ISHIBASHI |
4th Author's Affiliation | Tokyo Ohka Kogyo Co., Ltd. |
5th Author's Name | Hideki MATSUMURA |
5th Author's Affiliation | School of Materials Science, Japan Advanced Institute of Science and Technology |
Date | 2004/11/4 |
Paper # | CPM2004-134 |
Volume (vol) | vol.104 |
Number (no) | 425 |
Page | pp.pp.- |
#Pages | 5 |
Date of Issue |