Presentation 2004/10/15
GaN-based UV/blue electroluminescent devices deposited on Si at low temperature
Y AOKI, T HONDA, F HASEGAWA, H KAWANISHI,
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Abstract(in English) Gallium-nitride (GaN) layers were grown on (111)Si substrates at 450 ℃ by compound source molecular beam epitaxy (CS-MBE). Streaky reflection high-energy electron diffraction (RHEED) patterns of the GaN layers at RT were observed after the growth. X-ray diffraction peak was observed. The results indicate the crystal growth of a hexagonal GaN on a Si substrate and the effectiveness of CS-MBE in the fabrication of GaN layers at low temperature. GaN-based electroluminescent devices (ELDs) using CS-MBE were fabricated on the Si substrates. Purplish blue emission was observed from the ELDs under the AC operation.
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Keyword(in English) GaN / Electroluminescent Devices / Nitride semiconductors / Low temperature growth
Paper # ED2004-151,CPM2004-125,LQE2004-89
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Committee CPM
Conference Date 2004/10/15(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
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Title (in English) GaN-based UV/blue electroluminescent devices deposited on Si at low temperature
Sub Title (in English)
Keyword(1) GaN
Keyword(2) Electroluminescent Devices
Keyword(3) Nitride semiconductors
Keyword(4) Low temperature growth
1st Author's Name Y AOKI
1st Author's Affiliation Department of Engineering, Kogakum University()
2nd Author's Name T HONDA
2nd Author's Affiliation Department of Engineering, Kogakum University
3rd Author's Name F HASEGAWA
3rd Author's Affiliation Department of Engineering, Kogakum University
4th Author's Name H KAWANISHI
4th Author's Affiliation Department of Engineering, Kogakum University
Date 2004/10/15
Paper # ED2004-151,CPM2004-125,LQE2004-89
Volume (vol) vol.104
Number (no) 360
Page pp.pp.-
#Pages 4
Date of Issue