Presentation | 2004/10/15 Fine patterning of nitride semiconductors and fabrication of distributed Bragg reflector mirrors by focused ion beam Yoshitaka Hatada, Teruhisa Kotani, Mitsuru Funato, Yukio Narukawa, Takashi Mukai, Yoichi Kawakami, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Fine-patterning of nitride semiconductors, which is a key material for optical applications in the short wavelength range, was performed, using a focused ion beam (FIB) technique. The etching characteristics were investigated and air/GaN distributed Bragg reflector (DBR) mirrors were fabricated. The root-mean-square roughness of the sidewall of etched area was measured by atomic force microscopy to be 0.5-0.8 nm. Namely, the etched surface was optically smooth, and so we fabricated air/GaN DBR mirrors at the end of laser cavities as a test structure. The internal loss factor was firstly evaluated to be 42 cm^<-1> and using this quantity the reflectivity of the fabricated DBR mirrors was estimated to be 62%, which was much higher than that of conventional facet mirrors (17%). |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | nitride semiconductor / focused ion beam / distributed Bragg reflector |
Paper # | ED2004-147,CPM2004-121,LQE2004-85 |
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Committee | CPM |
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Conference Date | 2004/10/15(1days) |
Place (in Japanese) | (See Japanese page) |
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Registration To | Component Parts and Materials (CPM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Fine patterning of nitride semiconductors and fabrication of distributed Bragg reflector mirrors by focused ion beam |
Sub Title (in English) | |
Keyword(1) | nitride semiconductor |
Keyword(2) | focused ion beam |
Keyword(3) | distributed Bragg reflector |
1st Author's Name | Yoshitaka Hatada |
1st Author's Affiliation | Department of Electronic Science and Engineering, Kyoto University() |
2nd Author's Name | Teruhisa Kotani |
2nd Author's Affiliation | Department of Electronic Science and Engineering, Kyoto University |
3rd Author's Name | Mitsuru Funato |
3rd Author's Affiliation | Department of Electronic Science and Engineering, Kyoto University |
4th Author's Name | Yukio Narukawa |
4th Author's Affiliation | Nitride Semiconductor Research Lab. Nichia Corporation |
5th Author's Name | Takashi Mukai |
5th Author's Affiliation | Nitride Semiconductor Research Lab. Nichia Corporation |
6th Author's Name | Yoichi Kawakami |
6th Author's Affiliation | Department of Electronic Science and Engineering, Kyoto University |
Date | 2004/10/15 |
Paper # | ED2004-147,CPM2004-121,LQE2004-85 |
Volume (vol) | vol.104 |
Number (no) | 360 |
Page | pp.pp.- |
#Pages | 6 |
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