| Presentation | 2004/10/15 Fabrication and Application of One-Dimensional Photonic Crystal Kazuhiko HOSOMI, Toshihiko FUKAMACHI, Hiroji YAMADA, Toshio KATSUYAMA, Yasuhiko ARAKAWA, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | One-dimensional (1D) photonic crystals composed of deeply etched silicon were developed, and their transmission characteristics were measured. Because of its simplicity, a ID photonic crystal is a promising structure for academic research as well as commercial applications. In particular, a planer-type device fabricated on a silicon wafer is considered to have many advantageous for various applications. The structure is made of a high-aspect-ratio silicon plate fabricated by dry etching. The thickness and the height of the silicon plates are respectively 300 nm and 10 μm. In the experimentally measured spectrum, the transmittance is obviously suppressed which is considered to correspond to the band gap. The suppressed value of transmittance was at least 30 dB. The experimental result agrees well with the calculation; therefore, it is concluded that this experiment confirmed the fundamental function of the proposed 1D-photonic-crystal structure. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Photonic Crystal / Band Gap / High Aspect Ratio / Dry Etching |
| Paper # | ED2004-145,CPM2004-119,LQE2004-83 |
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| Conference Information | |
| Committee | CPM |
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| Conference Date | 2004/10/15(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
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| Vice Chair | |
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| Paper Information | |
| Registration To | Component Parts and Materials (CPM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Fabrication and Application of One-Dimensional Photonic Crystal |
| Sub Title (in English) | |
| Keyword(1) | Photonic Crystal |
| Keyword(2) | Band Gap |
| Keyword(3) | High Aspect Ratio |
| Keyword(4) | Dry Etching |
| 1st Author's Name | Kazuhiko HOSOMI |
| 1st Author's Affiliation | NCRC, IIS, University of Tokyo:OITDA:Central Research Laboratory, Hitachi, Ltd.() |
| 2nd Author's Name | Toshihiko FUKAMACHI |
| 2nd Author's Affiliation | NCRC, IIS, University of Tokyo:OITDA:Central Research Laboratory, Hitachi, Ltd. |
| 3rd Author's Name | Hiroji YAMADA |
| 3rd Author's Affiliation | NCRC, IIS, University of Tokyo:OITDA:Central Research Laboratory, Hitachi, Ltd. |
| 4th Author's Name | Toshio KATSUYAMA |
| 4th Author's Affiliation | NCRC, IIS, University of Tokyo:OITDA |
| 5th Author's Name | Yasuhiko ARAKAWA |
| 5th Author's Affiliation | NCRC, IIS, University of Tokyo |
| Date | 2004/10/15 |
| Paper # | ED2004-145,CPM2004-119,LQE2004-83 |
| Volume (vol) | vol.104 |
| Number (no) | 360 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |