Presentation 2004/10/14
Al-Free n-Type Ohmic Contact for AlGaN/GaN Power HEMTs
Toshihiro OHKI, Masahito KANAMURA, Tsuyoshi TAKAHASHI, Toshihide KIKKAWA, Kazukiyo JOSHIN, Naoki HARA,
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Abstract(in English) We have demonstrated an Al-free Ti/Mo/Ta/Au-based n-type ohmic contact for high power AlGaN/GaN high electron mobility transistors (HEMTs). Our fabricated ohmic contact has an extremely smooth surface morphology and almost the same specific contact resistance (p_c) of 9.1 × 10^<-6> Ωcm^2 as conventional Ti/Al-based contacts. We have found that Mo, which is generally inserted as a barrier layer, has the effect of reducing contact resistance. Moreover, we have applied this ohmic technique to fabricate an AlGaN/GaN HEMT and obtained sufficient transconductance (g_m) of 210 mS/mm.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GaN / AlGaN / HEMT / FET / ohmic
Paper # ED2004-132,CPM2004-106,LQE2004-70
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Committee CPM
Conference Date 2004/10/14(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Al-Free n-Type Ohmic Contact for AlGaN/GaN Power HEMTs
Sub Title (in English)
Keyword(1) GaN
Keyword(2) AlGaN
Keyword(3) HEMT
Keyword(4) FET
Keyword(5) ohmic
1st Author's Name Toshihiro OHKI
1st Author's Affiliation Fujitsu Laboratories Ltd.()
2nd Author's Name Masahito KANAMURA
2nd Author's Affiliation Fujitsu Laboratories Ltd.
3rd Author's Name Tsuyoshi TAKAHASHI
3rd Author's Affiliation Fujitsu Laboratories Ltd.
4th Author's Name Toshihide KIKKAWA
4th Author's Affiliation Fujitsu Laboratories Ltd.
5th Author's Name Kazukiyo JOSHIN
5th Author's Affiliation Fujitsu Laboratories Ltd.
6th Author's Name Naoki HARA
6th Author's Affiliation Fujitsu Laboratories Ltd.
Date 2004/10/14
Paper # ED2004-132,CPM2004-106,LQE2004-70
Volume (vol) vol.104
Number (no) 359
Page pp.pp.-
#Pages 4
Date of Issue