Presentation | 2004/8/13 65nm-node CMOS Process for Low Power Devices : LOP Specific Ultra-Shallow Junction Technology, and LSTP Specific HfSiON Transistor Technology Fumio OOTSUKA, Akira MINEJI, Yasuyuki TAMURA, Takaoki SASAKI, Hiroji OZAKI, Mitsuo YASUHIRA, Tsunetoshi ARIKADO, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Flash lamp annealing increases the drivability of the pFETs with the shallow extension fabricated by SPE growth without deteriorating Vth roll-off. A high switching speed suitable for 65nm-node LOP has been obtained at the gate length of 35nm by using SPE+FLA activation process. For LSTP devices, HfSiON transistors with EOT=1.5nm have been developed. Fermi-Level Pinning was improved by depositing thin SiN'cap on HfSiON. Tolerable NBTI/PBTI lifetime has been obtained at 1.1V supply voltage. |
Keyword(in Japanese) | (See Japanese page) |
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Paper # | SDM2004-149,ICD2004-91 |
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Committee | ICD |
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Conference Date | 2004/8/13(1days) |
Place (in Japanese) | (See Japanese page) |
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Registration To | Integrated Circuits and Devices (ICD) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | 65nm-node CMOS Process for Low Power Devices : LOP Specific Ultra-Shallow Junction Technology, and LSTP Specific HfSiON Transistor Technology |
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1st Author's Name | Fumio OOTSUKA |
1st Author's Affiliation | Research Dept. 1, Semiconductor Leading Edge Technologies, Inc.(Selete)() |
2nd Author's Name | Akira MINEJI |
2nd Author's Affiliation | Research Dept. 1, Semiconductor Leading Edge Technologies, Inc.(Selete) |
3rd Author's Name | Yasuyuki TAMURA |
3rd Author's Affiliation | Research Dept. 1, Semiconductor Leading Edge Technologies, Inc.(Selete) |
4th Author's Name | Takaoki SASAKI |
4th Author's Affiliation | Research Dept. 1, Semiconductor Leading Edge Technologies, Inc.(Selete) |
5th Author's Name | Hiroji OZAKI |
5th Author's Affiliation | Research Dept. 1, Semiconductor Leading Edge Technologies, Inc.(Selete) |
6th Author's Name | Mitsuo YASUHIRA |
6th Author's Affiliation | Research Dept. 1, Semiconductor Leading Edge Technologies, Inc.(Selete) |
7th Author's Name | Tsunetoshi ARIKADO |
7th Author's Affiliation | Research Dept. 1, Semiconductor Leading Edge Technologies, Inc.(Selete) |
Date | 2004/8/13 |
Paper # | SDM2004-149,ICD2004-91 |
Volume (vol) | vol.104 |
Number (no) | 251 |
Page | pp.pp.- |
#Pages | 6 |
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