Presentation 1995/10/24
Pulsed-laser-induced crystallization of fluorinated microcrystalline silicon films with different crystalline fraction
H.S. Choi, K.H. Jang, B.H. Min, M.K. Han,
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Abstract(in English) Laser-induced crystallization effects on fluorinated microcrystalline silicon films, in which the crystalline fraction is varied, have been investigated. Crystalline fractions of initial films, which has been evaluated from Raman data, is found to influence the laser-induced grain growth behavior. The gain growth is enhanced by the increase of surface melting and solidification times in the film with a critical initial crystalline fraction as well as by the fast lateral grain growth in the film with a relative high initial crystalline fraction.
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Keyword(in English) pulsed-laser / microcrystalline silicon / crystalline fraction / grain growth
Paper # EID95-82
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Committee EID
Conference Date 1995/10/24(1days)
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Language ENG
Title (in Japanese) (See Japanese page)
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Title (in English) Pulsed-laser-induced crystallization of fluorinated microcrystalline silicon films with different crystalline fraction
Sub Title (in English)
Keyword(1) pulsed-laser
Keyword(2) microcrystalline silicon
Keyword(3) crystalline fraction
Keyword(4) grain growth
1st Author's Name H.S. Choi
1st Author's Affiliation Department of Electrical Engineering, Seoul National University()
2nd Author's Name K.H. Jang
2nd Author's Affiliation Department of Electrical Engineering, Seoul National University
3rd Author's Name B.H. Min
3rd Author's Affiliation Department of Electrical Engineering, Seoul National University
4th Author's Name M.K. Han
4th Author's Affiliation Department of Electrical Engineering, Seoul National University
Date 1995/10/24
Paper # EID95-82
Volume (vol) vol.95
Number (no) 336
Page pp.pp.-
#Pages 6
Date of Issue