Presentation 1995/10/24
Field Emission Behavior of Diamond-like Carbon Films
Kwang-Ryeol Lee, Kwang Yong Eun, Bokeon Jeong, Dong-Ryul Jeon,
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Abstract(in English) Field emission behaviors from (nitrogenated) diamond-like carbon (DLC) films deposited on p-type Si (100) wafer by r.f. plasma assisted CVD method were investigated. Bias voltage of the substrate was varied from - 100V to -900V at a fixed pressure of l0mTorr. Onset field of the film deposited at the bias voltage of -100V was 10V/μm, while those of the films deposited at higher bias voltage were 20-24V/μm. The effective work functions of all DLC films were 0.05 eV. Nitrogen incorporation to DLC films enhanced the field emission behavior. Depending on the nitrogen source, the effective work functions ranged from 0.02 to 0.04eV. This behavior may be related to more efficient transport carriers from doped Si, through the film, to the emitting surface.
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Keyword(in English) Field emission behavior / Diamond-like carbon film / plasma CVD / Nitrogenated diamond-like carbon film
Paper # EID95-69
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Conference Date 1995/10/24(1days)
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Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Field Emission Behavior of Diamond-like Carbon Films
Sub Title (in English)
Keyword(1) Field emission behavior
Keyword(2) Diamond-like carbon film
Keyword(3) plasma CVD
Keyword(4) Nitrogenated diamond-like carbon film
1st Author's Name Kwang-Ryeol Lee
1st Author's Affiliation Division of Ceramics, KIST()
2nd Author's Name Kwang Yong Eun
2nd Author's Affiliation Division of Ceramics, KIST
3rd Author's Name Bokeon Jeong
3rd Author's Affiliation Department of Physics, Myongji University
4th Author's Name Dong-Ryul Jeon
4th Author's Affiliation Department of Physics, Myongji University
Date 1995/10/24
Paper # EID95-69
Volume (vol) vol.95
Number (no) 336
Page pp.pp.-
#Pages 6
Date of Issue