Presentation 1998/7/24
Electrical Properties of Ferroelectric Bi_4Ti_3O_12 Film Grown on Si Substrate Using Bi_2SiO_5 Buffer Layer
Takeshi KIJIMA, Hironori MATSUNAGA,
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Abstract(in English) 100, 200 and 400nm thick Bi_4Ti_3O_12 thin films were prepared on Si(100)substrate using 30nm-Bi_2SiO_5 as a buffer layer by MOCVD method.It is demonstrated that c-axis oriented Bi_4Ti_3O_12 films can be grown on Si substrate at 500℃ using a-axis oriented Bi_2SiO_5 buffer layer.The capacitance-vs-voltage(C-V) characteristics of Pt/Bi_4Ti_3O_12/Bi_2SiO_5/Si(MFIS)structures have ferroelectric switching properties, and the memory windows were about 0.8, 1.5 and 2.9V for 100, 200 and 400nm-Bi_4Ti_3O_12s, respectively. Furthermore, it is shown that the capacitance at zero-bias shows almost constant for 11 days.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) MF(1)S-FET / ferroelectric thin film / Bi_4Ti_3O_12 / bismuth silicate / Bi_2SiO_5 / MOCVD method
Paper # SDM98-104,ICD98-103
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Conference Information
Committee SDM
Conference Date 1998/7/24(1days)
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Registration To Silicon Device and Materials (SDM)
Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Electrical Properties of Ferroelectric Bi_4Ti_3O_12 Film Grown on Si Substrate Using Bi_2SiO_5 Buffer Layer
Sub Title (in English)
Keyword(1) MF(1)S-FET
Keyword(2) ferroelectric thin film
Keyword(3) Bi_4Ti_3O_12
Keyword(4) bismuth silicate
Keyword(5) Bi_2SiO_5
Keyword(6) MOCVD method
1st Author's Name Takeshi KIJIMA
1st Author's Affiliation Functional Devices Laboratories, SHARP Corporation,()
2nd Author's Name Hironori MATSUNAGA
2nd Author's Affiliation Functional Devices Laboratories, SHARP Corporation,
Date 1998/7/24
Paper # SDM98-104,ICD98-103
Volume (vol) vol.98
Number (no) 194
Page pp.pp.-
#Pages 6
Date of Issue