| Presentation | 1998/7/24 A Study on Advantage of Sol-Gel Method in forming Sr_2Bi_2TaO_9 Thin Films Yoshihiro Sawada, Akira Hashimoto, Ichiro Koiwa, Hiroyo Kato, Takao Kanehara, Tetsuya Osaka, |
|---|---|
| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | In recent years, SrBi_2Ta_2O_9(SBT)thin films have been receiving attention as fatiguefree ferroelectric materials. Research has become quite active in this area. The metal organic decomposition(MOD) method is principally used to form those thin films. This article presents an originally developed hydrolyzed sol-gel coating solution and discusses the advantages of the SBT thin film forming process. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | SrBi_2Ta_2O_9(SBT) / hydrolysis / sol-gel method / metalloxane bond |
| Paper # | SDM98-101,ICD98-100 |
| Date of Issue |
| Conference Information | |
| Committee | SDM |
|---|---|
| Conference Date | 1998/7/24(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
|---|---|
| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | A Study on Advantage of Sol-Gel Method in forming Sr_2Bi_2TaO_9 Thin Films |
| Sub Title (in English) | |
| Keyword(1) | SrBi_2Ta_2O_9(SBT) |
| Keyword(2) | hydrolysis |
| Keyword(3) | sol-gel method |
| Keyword(4) | metalloxane bond |
| 1st Author's Name | Yoshihiro Sawada |
| 1st Author's Affiliation | Specialty Development Division 1, Research & Development Department, Tokyo Ohka Kogyo Co. Ltd.() |
| 2nd Author's Name | Akira Hashimoto |
| 2nd Author's Affiliation | Specialty Development Division 1, Research & Development Department, Tokyo Ohka Kogyo Co. Ltd. |
| 3rd Author's Name | Ichiro Koiwa |
| 3rd Author's Affiliation | Semiconductor Technology Laboratory, Research & Development Group, Oki Electric Industry Co. Ltd. |
| 4th Author's Name | Hiroyo Kato |
| 4th Author's Affiliation | Semiconductor Technology Laboratory, Research & Development Group, Oki Electric Industry Co. Ltd. |
| 5th Author's Name | Takao Kanehara |
| 5th Author's Affiliation | Semiconductor Technology Laboratory, Research & Development Group, Oki Electric lndustry Co. Ltd. |
| 6th Author's Name | Tetsuya Osaka |
| 6th Author's Affiliation | School of Science and Engineering, Waseda University |
| Date | 1998/7/24 |
| Paper # | SDM98-101,ICD98-100 |
| Volume (vol) | vol.98 |
| Number (no) | 194 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |