Presentation | 1998/7/24 Implementation of isolation structures by top-surface imaging process Hyoung-Gi Kim, Myoung-Soo Kim, Cheol-Kyu Bok, Hyeong-Soo Kim, Ki-Ho Baik, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | It is well that TIPS(Top-surface Imaging Process by Silylation)process has a feasibility to overcome lots of problems induced from single-layers resist process.Nevertheless, chip makers have been reluctant to apply this process to Giga technogy with process issues such as Line Edge Roughness(LER), residues, Critical Dimension(CD) unifromity, and rework scheme.In this paper, we will describe the results of 180nm isolation structures of 1G bit DRAM on process issues.We have also developed rework procedures to remove the resist pattern formed after dry development by using BOE and clean-D(H_2SO_4 and H_2O_2 mixture)solutions. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | TIPS(Top-surface Imaging Process by Silylation) / DUV lithography / rework / silylation / dry development / Line Edge Roughness(LER) |
Paper # | SDM98-99,ICD98-98 |
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Conference Information | |
Committee | SDM |
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Conference Date | 1998/7/24(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Silicon Device and Materials (SDM) |
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Language | ENG |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Implementation of isolation structures by top-surface imaging process |
Sub Title (in English) | |
Keyword(1) | TIPS(Top-surface Imaging Process by Silylation) |
Keyword(2) | DUV lithography |
Keyword(3) | rework |
Keyword(4) | silylation |
Keyword(5) | dry development |
Keyword(6) | Line Edge Roughness(LER) |
1st Author's Name | Hyoung-Gi Kim |
1st Author's Affiliation | Hyundai Electronics Induestries.() |
2nd Author's Name | Myoung-Soo Kim |
2nd Author's Affiliation | Hyundai Electronics Induestries. |
3rd Author's Name | Cheol-Kyu Bok |
3rd Author's Affiliation | Hyundai Electronics Induestries. |
4th Author's Name | Hyeong-Soo Kim |
4th Author's Affiliation | Hyundai Electronics Induestries. |
5th Author's Name | Ki-Ho Baik |
5th Author's Affiliation | Hyundai Electronics Induestries. |
Date | 1998/7/24 |
Paper # | SDM98-99,ICD98-98 |
Volume (vol) | vol.98 |
Number (no) | 194 |
Page | pp.pp.- |
#Pages | 7 |
Date of Issue |