| Presentation | 1998/7/24 Thin Resist Approximation Model for Optical Proximity Correction Chang-Nam Ahn, Hee-Bom Kim, Young-Mog Ham, Yung-Mo Koo, Ki-Ho Baik, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Optical proximity correction technique has been studied. The occurrence of proximity effect in the optical lithography is composed of an element caused by diffraction of light, which can be explained by aerial image simulation, and an element caused by resist process, in which acid diffusion is a major factor causing non-linearity.In the case of very thin resist, absorbed energy that generates the acid can be described by two-dimensional instead of three-dimensional distribution.Under this simple assumption, acid diffusion by post exposure bake is equivalent to the diffusion of aerial image, and chemical amplification can be analytically described also. Modified aerial image including diffusion and chemical amplification, we call it diffused aerial image, can give the information for patterning status directly.Therefore, diffused aerial image model can explain experimental results very well compared to the expectation by using aerial image only without loss of simplicity and calculation speed. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | optical proximity correction / acid diffusion / aerial image / diffused aerial image |
| Paper # | SDM98-98,ICD98-97 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 1998/7/24(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Thin Resist Approximation Model for Optical Proximity Correction |
| Sub Title (in English) | |
| Keyword(1) | optical proximity correction |
| Keyword(2) | acid diffusion |
| Keyword(3) | aerial image |
| Keyword(4) | diffused aerial image |
| 1st Author's Name | Chang-Nam Ahn |
| 1st Author's Affiliation | Semiconductor Research Div., Hyundai Electronics Industries Co., Ltd.,() |
| 2nd Author's Name | Hee-Bom Kim |
| 2nd Author's Affiliation | Semiconductor Research Div., Hyundai Electronics Industries Co., Ltd., |
| 3rd Author's Name | Young-Mog Ham |
| 3rd Author's Affiliation | Semiconductor Research Div., Hyundai Electronics Industries Co., Ltd., |
| 4th Author's Name | Yung-Mo Koo |
| 4th Author's Affiliation | Semiconductor Research Div., Hyundai Electronics Industries Co., Ltd., |
| 5th Author's Name | Ki-Ho Baik |
| 5th Author's Affiliation | Semiconductor Research Div., Hyundai Electronics Industries Co., Ltd., |
| Date | 1998/7/24 |
| Paper # | SDM98-98,ICD98-97 |
| Volume (vol) | vol.98 |
| Number (no) | 194 |
| Page | pp.pp.- |
| #Pages | 8 |
| Date of Issue | |