Presentation 2001/7/27
A study of analog characteristics of CMOS with heavily nitrided NO oxynitrides
Tatsuya Ohguro, Takeshi Nagano, Makoto Fujiwara, Mariko Takayanagi, Kei Shimizu, Hisayo Momose, Shinichi Nakamura, Yoshiaki Toyoshima,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) There are limitations of interface state density at oxynitride/Si substrate in order to satisfy 1999 road map requirements. Because 1/f noise and ft value in S.C PMOS degrade due to higher-density interface state density inside the valence band. A buried channel type MOSFET is effective for suppressing these degradations.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) oxynitride / 1/f noise / fT / buried channel type
Paper # SDM2001-138,ICD2001-61
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Conference Information
Committee SDM
Conference Date 2001/7/27(1days)
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Paper Information
Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) A study of analog characteristics of CMOS with heavily nitrided NO oxynitrides
Sub Title (in English)
Keyword(1) oxynitride
Keyword(2) 1/f noise
Keyword(3) fT
Keyword(4) buried channel type
1st Author's Name Tatsuya Ohguro
1st Author's Affiliation Toshiba corporation, Semiconductor company, System LSI Research & Development()
2nd Author's Name Takeshi Nagano
2nd Author's Affiliation Toshiba corporation, Semiconductor company, System LSI Research & Development
3rd Author's Name Makoto Fujiwara
3rd Author's Affiliation Toshiba corporation, Semiconductor company, System LSI Research & Development
4th Author's Name Mariko Takayanagi
4th Author's Affiliation Toshiba corporation, Semiconductor company, System LSI Research & Development
5th Author's Name Kei Shimizu
5th Author's Affiliation Toshiba corporation, Semiconductor company, System LSI Research & Development
6th Author's Name Hisayo Momose
6th Author's Affiliation Toshiba corporation, Semiconductor company, System LSI Research & Development
7th Author's Name Shinichi Nakamura
7th Author's Affiliation Toshiba corporation, Semiconductor company, System LSI Research & Development
8th Author's Name Yoshiaki Toyoshima
8th Author's Affiliation Toshiba corporation, Semiconductor company, System LSI Research & Development
Date 2001/7/27
Paper # SDM2001-138,ICD2001-61
Volume (vol) vol.101
Number (no) 247
Page pp.pp.-
#Pages 6
Date of Issue