Presentation 2002/5/16
Growth of (1-101) GaN on a 7 degrees off axis (001) Si substrate
Norifumi KAMESHIRO, Yoshio HONDA, Masahito YAMAGUCHI, Nobuhiko SAWAKI,
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Abstract(in English) The GaN grown on a (111) Silicon substrate has, usually, many cracks because of the large mismatch of the thermal expansion coefficients. We have proposed a method to reduce the strain due to this large mismatch by inclining the C-axis. On a 7 degrees off axis (001) Silicon substrate (111) facets are made by anisotropic etching in KOH solution. On this facet we grew GaN selectively, of which (1-101) surface is parallel to the Silicon substrate. Moreover, we fabricated AlGaN/GaN heterostructures on the (1-101) GaN.
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Keyword(in English) GaN / (001)Si / MOVPE / Selective Area Growth / heterostructure
Paper # CPM2002-14
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Conference Date 2002/5/16(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Growth of (1-101) GaN on a 7 degrees off axis (001) Si substrate
Sub Title (in English)
Keyword(1) GaN
Keyword(2) (001)Si
Keyword(3) MOVPE
Keyword(4) Selective Area Growth
Keyword(5) heterostructure
1st Author's Name Norifumi KAMESHIRO
1st Author's Affiliation Department of Electronics, Graduate School of Engineering, Nagoya University()
2nd Author's Name Yoshio HONDA
2nd Author's Affiliation Department of Electronics, Graduate School of Engineering, Nagoya University
3rd Author's Name Masahito YAMAGUCHI
3rd Author's Affiliation Department of Electronics, Graduate School of Engineering, Nagoya University
4th Author's Name Nobuhiko SAWAKI
4th Author's Affiliation Department of Electronics, Graduate School of Engineering, Nagoya University
Date 2002/5/16
Paper # CPM2002-14
Volume (vol) vol.102
Number (no) 76
Page pp.pp.-
#Pages 5
Date of Issue