Presentation	1994/5/19 Total reflection X-ray fluorescence analysis for ultratrace surface contamination Kunihiro Miyazaki, Ayako Shimazaki,
PDF Download Page	PDF download Page Link
Abstract(in Japanese)	(See Japanese page)
Abstract(in English)	Recently,TRXRF analysis has been developed as a practical in- line heavy metal contamination monitoring method during the ULSI device fabrication process.With the progress of the ULSI device, further improvement of the detection sensitivity would be required. And the detection capability of light-elements such as sodium and aluminum which are also notable elements for the monitoring would be also required.In this paper,a new approach to TRXRF analysis of light elements and heavy metals simultaneously with high detection sensitivity by concentration method using silicon wafer with sputtered carbon film is introduced.And an also new approach,VPT is introduced,which is preparation method for high sensitivity in- line analysis.
Keyword(in Japanese)	(See Japanese page)
Keyword(in English)	TRXRF / Vapor Phase Decomposition / Vapor Phase Treatment
Paper #	CPM94-2
Date of Issue

Conference Information
Committee	CPM
Conference Date	1994/5/19(1days)
Place (in Japanese)	(See Japanese page)
Place (in English)
Topics (in Japanese)	(See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To	Component Parts and Materials (CPM)
Language	JPN
Title (in Japanese)	(See Japanese page)
Sub Title (in Japanese)	(See Japanese page)
Title (in English)	Total reflection X-ray fluorescence analysis for ultratrace surface contamination
Sub Title (in English)
Keyword(1)	TRXRF
Keyword(2)	Vapor Phase Decomposition
Keyword(3)	Vapor Phase Treatment
1st Author's Name	Kunihiro Miyazaki
1st Author's Affiliation	Semiconductor group,Toshiba()
2nd Author's Name	Ayako Shimazaki
2nd Author's Affiliation	Semiconductor group,Toshiba
Date	1994/5/19
Paper #	CPM94-2
Volume (vol)	vol.94
Number (no)	39
Page	pp.pp.-
#Pages	6
Date of Issue