Presentation 2002/5/8
Optical Waveguide Structure and its Fabrication Method with a Novel Photobleaching Type Polymeric Material
Katsuyuki IMOTO, Hiroshi TSUSHIMA, Emi WATANABE,
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Abstract(in English) We have developed a novel photobleaching type branched polysilane including an optimum silicone content. A new optical waveguide structure and its fabrication method with the same polymeric material for all waveguide layers of buffer, core, side cladding, and upper cladding have also innovated. We discovered that an excellent temperature stability up to 250℃ could realize by optimizing the branching degree of the polysilane and the silicone content. Furthermore, loss of the polymeric film was 0.04dB/cm at 1550nm wavelength.
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Keyword(in English) Photobleaching type waveguide / Temperature stability / Branched polysilane including silicone / Low loss film
Paper # OME2002-17
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Committee OME
Conference Date 2002/5/8(1days)
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Registration To Organic Material Electronics (OME)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Optical Waveguide Structure and its Fabrication Method with a Novel Photobleaching Type Polymeric Material
Sub Title (in English)
Keyword(1) Photobleaching type waveguide
Keyword(2) Temperature stability
Keyword(3) Branched polysilane including silicone
Keyword(4) Low loss film
1st Author's Name Katsuyuki IMOTO
1st Author's Affiliation Optoelectronic System Lab., Hitachi Cable, Ltd()
2nd Author's Name Hiroshi TSUSHIMA
2nd Author's Affiliation Fine Products Div., Nippon Paint Co, Ltd
3rd Author's Name Emi WATANABE
3rd Author's Affiliation Fine Products Div., Nippon Paint Co, Ltd
Date 2002/5/8
Paper # OME2002-17
Volume (vol) vol.102
Number (no) 47
Page pp.pp.-
#Pages 6
Date of Issue