Presentation 1995/7/26
Thin Film Formation by Positive and Negative Ions Deposition
Kanenaga Fujii, Yuji Horino, Nobuteru Tsubouchi, Akiyoshi Chayahara, Atsushi Kinomura,
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Abstract(in English) We have developed a new concept dual ion beam direct deposition apparatus. The machine consists of a positive ion beam line, a negative ion beam line and an ultra-high vacuum deposition chamber. The machine can generate mass-analyzed very low energy ion beams with positive and negative charges at the same time. It is possible to deposit both ions not only simultaneously but also alternatively. Ion energy range covers 10eV to 20keV. Typical ion beam current is ≧10μA depending on ion species. The machine has a wide possibility to fabricate ultra-pure materials such as metals, semiconductors, insulators and other interesting materials. The machine is also useful to study fundamental processes of ion beam deposition and/or ion solid surface interactions.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Ultra high purity materals / isotope separation / dual ion beam deposition / low enerugy ion beam technology / negative ion beam technology
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Committee OME
Conference Date 1995/7/26(1days)
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Registration To Organic Material Electronics (OME)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Thin Film Formation by Positive and Negative Ions Deposition
Sub Title (in English)
Keyword(1) Ultra high purity materals
Keyword(2) isotope separation
Keyword(3) dual ion beam deposition
Keyword(4) low enerugy ion beam technology
Keyword(5) negative ion beam technology
1st Author's Name Kanenaga Fujii
1st Author's Affiliation Osaka National Research Institute, AIST()
2nd Author's Name Yuji Horino
2nd Author's Affiliation Osaka National Research Institute, AIST
3rd Author's Name Nobuteru Tsubouchi
3rd Author's Affiliation Osaka National Research Institute, AIST
4th Author's Name Akiyoshi Chayahara
4th Author's Affiliation Osaka National Research Institute, AIST
5th Author's Name Atsushi Kinomura
5th Author's Affiliation Osaka National Research Institute, AIST
Date 1995/7/26
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Volume (vol) vol.95
Number (no) 187
Page pp.pp.-
#Pages 6
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