Presentation | 1995/7/26 Thin Film Formation by Positive and Negative Ions Deposition Kanenaga Fujii, Yuji Horino, Nobuteru Tsubouchi, Akiyoshi Chayahara, Atsushi Kinomura, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We have developed a new concept dual ion beam direct deposition apparatus. The machine consists of a positive ion beam line, a negative ion beam line and an ultra-high vacuum deposition chamber. The machine can generate mass-analyzed very low energy ion beams with positive and negative charges at the same time. It is possible to deposit both ions not only simultaneously but also alternatively. Ion energy range covers 10eV to 20keV. Typical ion beam current is ≧10μA depending on ion species. The machine has a wide possibility to fabricate ultra-pure materials such as metals, semiconductors, insulators and other interesting materials. The machine is also useful to study fundamental processes of ion beam deposition and/or ion solid surface interactions. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Ultra high purity materals / isotope separation / dual ion beam deposition / low enerugy ion beam technology / negative ion beam technology |
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Conference Information | |
Committee | OME |
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Conference Date | 1995/7/26(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Registration To | Organic Material Electronics (OME) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Thin Film Formation by Positive and Negative Ions Deposition |
Sub Title (in English) | |
Keyword(1) | Ultra high purity materals |
Keyword(2) | isotope separation |
Keyword(3) | dual ion beam deposition |
Keyword(4) | low enerugy ion beam technology |
Keyword(5) | negative ion beam technology |
1st Author's Name | Kanenaga Fujii |
1st Author's Affiliation | Osaka National Research Institute, AIST() |
2nd Author's Name | Yuji Horino |
2nd Author's Affiliation | Osaka National Research Institute, AIST |
3rd Author's Name | Nobuteru Tsubouchi |
3rd Author's Affiliation | Osaka National Research Institute, AIST |
4th Author's Name | Akiyoshi Chayahara |
4th Author's Affiliation | Osaka National Research Institute, AIST |
5th Author's Name | Atsushi Kinomura |
5th Author's Affiliation | Osaka National Research Institute, AIST |
Date | 1995/7/26 |
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Volume (vol) | vol.95 |
Number (no) | 187 |
Page | pp.pp.- |
#Pages | 6 |
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