| Presentation | 1995/7/26 Deposition with molecular beam and laser irradiation for photochemically reactive molecule H. Fuchigami, Y. Nakao, S. Tanimura, Y. Uehara, T. Kurata, S. Tsunoda, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We have investigated the structure of the bis(ethynylstyryl)benzene (BESB) films fabricated by a molecular beam deposition in the external photon field induced with KrF excimer laser (λ=248nm). The laser irradiation to the film surface after deposition caused the cis-to-trans photoisomerization and gave amorphous films due to disordering of the molecular arrangement. On the contrary, the photoisomerized trans-trans isomer crystalline films were found to be grown upon the irradiation during deposition at the substrate temperature of 60℃. These results indicate that the applied photon field to the molecular beam during deposition play a significant role in the formation of the highly ordered films. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | bis(ethynylstyryl)benzene / photoisomerization / molecular beam deposition / crystalline film |
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| Conference Information | |
| Committee | OME |
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| Conference Date | 1995/7/26(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Registration To | Organic Material Electronics (OME) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Deposition with molecular beam and laser irradiation for photochemically reactive molecule |
| Sub Title (in English) | |
| Keyword(1) | bis(ethynylstyryl)benzene |
| Keyword(2) | photoisomerization |
| Keyword(3) | molecular beam deposition |
| Keyword(4) | crystalline film |
| 1st Author's Name | H. Fuchigami |
| 1st Author's Affiliation | Mitsubishi Electric Corporation, Materials & Electronic Devices Laboratory() |
| 2nd Author's Name | Y. Nakao |
| 2nd Author's Affiliation | Mitsubishi Electric Corporation, Materials & Electronic Devices Laboratory |
| 3rd Author's Name | S. Tanimura |
| 3rd Author's Affiliation | Mitsubishi Electric Corporation, Materials & Electronic Devices Laboratory |
| 4th Author's Name | Y. Uehara |
| 4th Author's Affiliation | Mitsubishi Electric Corporation, Materials & Electronic Devices Laboratory |
| 5th Author's Name | T. Kurata |
| 5th Author's Affiliation | Mitsubishi Electric Corporation, Materials & Electronic Devices Laboratory |
| 6th Author's Name | S. Tsunoda |
| 6th Author's Affiliation | Mitsubishi Electric Corporation, Materials & Electronic Devices Laboratory |
| Date | 1995/7/26 |
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| Volume (vol) | vol.95 |
| Number (no) | 187 |
| Page | pp.pp.- |
| #Pages | 6 |
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