Presentation 1997/1/28
100 nm ultra fine pattern etching by a polyimide interface transmitted electron beam excited ICP
Tomoya Yamada, Shinji Ogawa, Ryouichi Inanami, Shinzou Morita,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Electron-beam excited plasma (EBEP),where the electron-beam was transmitted through the interface and excited the gas molecules has been developing. The transmitted electron-beam was increased up to about 3 mA by using polyimide as an interface material but the plasma couldn't be ignited only by the electron-beam. So the plasma was induced by superinposing the electron-beam and the inductively coupled plasma (ICP) and a etching through 100 nm resist pattern was performed successfuly. Electron temperature was higher when electron-beam was irradiated from the result of probe mesurement. This suggests that the electron-beam contribute to the maintainance of steady discharge of low RF power.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) EBEP / Polyimide interface / 100 nm etching / probe measurement / increase of electron temperature
Paper # OME96-86
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Committee OME
Conference Date 1997/1/28(1days)
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Paper Information
Registration To Organic Material Electronics (OME)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) 100 nm ultra fine pattern etching by a polyimide interface transmitted electron beam excited ICP
Sub Title (in English)
Keyword(1) EBEP
Keyword(2) Polyimide interface
Keyword(3) 100 nm etching
Keyword(4) probe measurement
Keyword(5) increase of electron temperature
1st Author's Name Tomoya Yamada
1st Author's Affiliation Center for cooperative research in advanced science and technology, Nagoya University()
2nd Author's Name Shinji Ogawa
2nd Author's Affiliation Center for cooperative research in advanced science and technology, Nagoya University
3rd Author's Name Ryouichi Inanami
3rd Author's Affiliation Center for cooperative research in advanced science and technology, Nagoya University
4th Author's Name Shinzou Morita
4th Author's Affiliation Center for cooperative research in advanced science and Technology, Nagoya University
Date 1997/1/28
Paper # OME96-86
Volume (vol) vol.96
Number (no) 502
Page pp.pp.-
#Pages 4
Date of Issue