Presentation | 1997/1/28 100 nm ultra fine pattern etching by a polyimide interface transmitted electron beam excited ICP Tomoya Yamada, Shinji Ogawa, Ryouichi Inanami, Shinzou Morita, |
---|---|
PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Electron-beam excited plasma (EBEP),where the electron-beam was transmitted through the interface and excited the gas molecules has been developing. The transmitted electron-beam was increased up to about 3 mA by using polyimide as an interface material but the plasma couldn't be ignited only by the electron-beam. So the plasma was induced by superinposing the electron-beam and the inductively coupled plasma (ICP) and a etching through 100 nm resist pattern was performed successfuly. Electron temperature was higher when electron-beam was irradiated from the result of probe mesurement. This suggests that the electron-beam contribute to the maintainance of steady discharge of low RF power. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | EBEP / Polyimide interface / 100 nm etching / probe measurement / increase of electron temperature |
Paper # | OME96-86 |
Date of Issue |
Conference Information | |
Committee | OME |
---|---|
Conference Date | 1997/1/28(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | |
Vice Chair | |
Secretary | |
Assistant |
Paper Information | |
Registration To | Organic Material Electronics (OME) |
---|---|
Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | 100 nm ultra fine pattern etching by a polyimide interface transmitted electron beam excited ICP |
Sub Title (in English) | |
Keyword(1) | EBEP |
Keyword(2) | Polyimide interface |
Keyword(3) | 100 nm etching |
Keyword(4) | probe measurement |
Keyword(5) | increase of electron temperature |
1st Author's Name | Tomoya Yamada |
1st Author's Affiliation | Center for cooperative research in advanced science and technology, Nagoya University() |
2nd Author's Name | Shinji Ogawa |
2nd Author's Affiliation | Center for cooperative research in advanced science and technology, Nagoya University |
3rd Author's Name | Ryouichi Inanami |
3rd Author's Affiliation | Center for cooperative research in advanced science and technology, Nagoya University |
4th Author's Name | Shinzou Morita |
4th Author's Affiliation | Center for cooperative research in advanced science and Technology, Nagoya University |
Date | 1997/1/28 |
Paper # | OME96-86 |
Volume (vol) | vol.96 |
Number (no) | 502 |
Page | pp.pp.- |
#Pages | 4 |
Date of Issue |