| Presentation | 1996/9/26 Parameter extractions of boron ion implantation using Genetic Algorithms R. Sudo, S. Kojima, K. Suzuki, M. Sato, K. Suzuki, |
|---|---|
| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Pearson parameters for impurity distributions were extracted from as-implanted profiles obtained by SIMS. Genetic Algorithms (GA) were applied to extract person parameters. Simulated profiles using parameters extracted by GA agree well with SIMS profiles over a wide range of energies and doses for boron ion implants. To decrease computational time of the parameter extractions, Levenberg-Marquardt method (LM-method) was applied after GA extractions. The total computational time of GA combined with LM-method was 10% compared with GA. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | process simulator / ion implantation / Genetic Algorithms |
| Paper # | VLD96-37,ED96-83,SDM96-93 |
| Date of Issue |
| Conference Information | |
| Committee | VLD |
|---|---|
| Conference Date | 1996/9/26(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | VLSI Design Technologies (VLD) |
|---|---|
| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Parameter extractions of boron ion implantation using Genetic Algorithms |
| Sub Title (in English) | |
| Keyword(1) | process simulator |
| Keyword(2) | ion implantation |
| Keyword(3) | Genetic Algorithms |
| 1st Author's Name | R. Sudo |
| 1st Author's Affiliation | Electron Devices And Materials Laboratories, Fujitsu Laboratories Ltd.() |
| 2nd Author's Name | S. Kojima |
| 2nd Author's Affiliation | Process development devision, Fujitsu Ltd. |
| 3rd Author's Name | K. Suzuki |
| 3rd Author's Affiliation | Process development devision, Fujitsu Ltd. |
| 4th Author's Name | M. Sato |
| 4th Author's Affiliation | Research Center for Computational Science, Fujitsu Ltd. |
| 5th Author's Name | K. Suzuki |
| 5th Author's Affiliation | Electron Devices And Materials Laboratories, Fujitsu Laboratories Ltd. |
| Date | 1996/9/26 |
| Paper # | VLD96-37,ED96-83,SDM96-93 |
| Volume (vol) | vol.96 |
| Number (no) | 258 |
| Page | pp.pp.- |
| #Pages | 8 |
| Date of Issue | |