Presentation 2002/1/21
Fabrication of InGaAs quantum dots formation along GaAs multiatomic steps
T. Ishihara, M. Akabori, J. Motohisa, T. Fukui,
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Abstract(in English) The uniform and self-aligned S-K mode InGaAs quantum dots were formed on GaAs multiatomic steps on (001) vicinal surface by MOVPE. Under optimum In content (x=O.8) and InGaAs layer thickness (3.2ML) condition highly uniform InGaAs quantum dots were obtained. The size distribution of InGaAs dots depends on GaAs multiatomic step width strongly. The misorientation angle dependence on the formation of InGaAs quantum dots on GaAs multiatomic steps were also observed by AFM and PL. The results of PL measurement agreed well with AFM results.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) MOVPE / GaAs(001) vicinal substrate / GaAs multiatomic step / S-K mode quantum dot
Paper # 2001-ED-228,2001-SDM-231
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Committee ED
Conference Date 2002/1/21(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication of InGaAs quantum dots formation along GaAs multiatomic steps
Sub Title (in English)
Keyword(1) MOVPE
Keyword(2) GaAs(001) vicinal substrate
Keyword(3) GaAs multiatomic step
Keyword(4) S-K mode quantum dot
1st Author's Name T. Ishihara
1st Author's Affiliation Research Center for Integrated Quantum Electronics, Hokkaido University()
2nd Author's Name M. Akabori
2nd Author's Affiliation Research Center for Integrated Quantum Electronics, Hokkaido University
3rd Author's Name J. Motohisa
3rd Author's Affiliation Research Center for Integrated Quantum Electronics, Hokkaido University
4th Author's Name T. Fukui
4th Author's Affiliation Research Center for Integrated Quantum Electronics, Hokkaido University
Date 2002/1/21
Paper # 2001-ED-228,2001-SDM-231
Volume (vol) vol.101
Number (no) 617
Page pp.pp.-
#Pages 6
Date of Issue