| Presentation | 2001/6/28 A NEW CHEMICAL MECHANICAL POLISHING METHOD USING THE FROZEN ETCHANT PAD Youn-Jin Oh, Gyung-Soon Park, Sung Yong Park, Jae-Ok Ryu, Tae Woo Jung, Il-Wook Kim, Chan-Hwa Chung, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We have developed the new-concept CMP process named as the Forzen Chemical Etching (FCE) process, which uses a frozen etchant pad instead of conventional slurries and polymer pads. Bacause the polishing has been processed without the slurries and porous pad, we believe that the current difficulties in the conventional CMP process are possible solved. The performance of the frozen etchant polishing is strongly dependent on the chemical composition of the frozen etchant pad and the process temperatures. In our preliminary experimental results, we found that this new process concept should be applicable to the future device manufacturing technologies in microelectronics fabrication. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | chemical Mechanical Polishing / forzen Etchant pad / etching solution |
| Paper # | ED2001-53, SDM2001-60 |
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| Conference Information | |
| Committee | ED |
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| Conference Date | 2001/6/28(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
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| Paper Information | |
| Registration To | Electron Devices (ED) |
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| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | A NEW CHEMICAL MECHANICAL POLISHING METHOD USING THE FROZEN ETCHANT PAD |
| Sub Title (in English) | |
| Keyword(1) | chemical Mechanical Polishing |
| Keyword(2) | forzen Etchant pad |
| Keyword(3) | etching solution |
| 1st Author's Name | Youn-Jin Oh |
| 1st Author's Affiliation | Dept.of Chemical Engineering, Sungkyunkwan University() |
| 2nd Author's Name | Gyung-Soon Park |
| 2nd Author's Affiliation | Dept.of Chemical Engineering, Sungkyunkwan University |
| 3rd Author's Name | Sung Yong Park |
| 3rd Author's Affiliation | Fine Semitech Co., Ltd. |
| 4th Author's Name | Jae-Ok Ryu |
| 4th Author's Affiliation | Hynix Semiconductor Inc. |
| 5th Author's Name | Tae Woo Jung |
| 5th Author's Affiliation | Hynix Semiconductor Inc. |
| 6th Author's Name | Il-Wook Kim |
| 6th Author's Affiliation | Hynix Semiconductor Inc. |
| 7th Author's Name | Chan-Hwa Chung |
| 7th Author's Affiliation | Dept.of Chemical Engineering, Sungkyunkwan University |
| Date | 2001/6/28 |
| Paper # | ED2001-53, SDM2001-60 |
| Volume (vol) | vol.101 |
| Number (no) | 160 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |