Presentation 2000/10/13
InN/Si heterojunction fabricated by RF-MBE and its band offset
Takashi Yamashita, Kouji Suzuki, Takao Nakano, Masahiro Yoshimoto, Junji Saraie,
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Abstract(in English) InN was grown on Si at 500℃ by molecular beam epitaxy (MBE) using In metal and activated nitrogen species generated in rf plasma. The grown layer showed a flat surface and n^+-type conduction with an electron concentration of 3×10^<20>cm^<-3> and a Hall mobility of 28cm^2/Vs. The band offset of InN/Si heterojunction was determined using X-ray photoemission spectroscopy. The top of the valence band of InN was evaluated to be located at 1.60eV lower than that of Si. This implies that the InN/Si heterojunction is a promising system to realize a barrier against holes in Si devices.
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Keyword(in English) InN / Si / heterojunction / X-ray photoemission spectroscopy / band offset / MBE
Paper # ED2000-174,CPM2000-113
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Committee ED
Conference Date 2000/10/13(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) InN/Si heterojunction fabricated by RF-MBE and its band offset
Sub Title (in English)
Keyword(1) InN
Keyword(2) Si
Keyword(3) heterojunction
Keyword(4) X-ray photoemission spectroscopy
Keyword(5) band offset
Keyword(6) MBE
1st Author's Name Takashi Yamashita
1st Author's Affiliation Department of Electronics and Information Science Kyoto Institute of Technology()
2nd Author's Name Kouji Suzuki
2nd Author's Affiliation Department of Electronics and Information Science Kyoto Institute of Technology
3rd Author's Name Takao Nakano
3rd Author's Affiliation Department of Electronics and Information Science Kyoto Institute of Technology
4th Author's Name Masahiro Yoshimoto
4th Author's Affiliation Department of Electronics and Information Science Kyoto Institute of Technology
5th Author's Name Junji Saraie
5th Author's Affiliation Department of Electronics and Information Science Kyoto Institute of Technology
Date 2000/10/13
Paper # ED2000-174,CPM2000-113
Volume (vol) vol.100
Number (no) 370
Page pp.pp.-
#Pages 6
Date of Issue