Presentation | 2000/5/12 Fabrication zinc oxide thin films by reactive sihilded vacuum arc ion plating Keisaku Kimura, Ryuichi Miyano, Hirofumi Takikawa, Tateki Sakakibara, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Zinc oxide thin films were prepared on a borosilicate glass substrate by a steered and shielded reactive vacuum arc deposition method. The cathode spot was driven on a cathode surface using weak and strong permanent magnets, placed behind the cathode. The arc was operated at DC 30 A and the in-process pressure was varied from 0.1 to 5.0 Pa. All films had a strong ZnO(200)peak, indicating c-axis orientation. Highly transparent films in visual region were obtained at 0.5 and 3.0 Pa with both weak and strong magnets. With the strong magnet, electric resistivity varied from 10^-3 to 15 Ω cm as the pressure increased. However, with the weak magnet, resistivity on the order of 10^-3 Ω cm order was obtained over a wide pressure range of 0.1 to 1.0 Pa. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | vacuum arc deposition / zinc oxide thin film / crystalline and optical properties / electric resistivity |
Paper # | ED2000-29,CPM2000-14,SDM2000-29 |
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Conference Information | |
Committee | ED |
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Conference Date | 2000/5/12(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Electron Devices (ED) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Fabrication zinc oxide thin films by reactive sihilded vacuum arc ion plating |
Sub Title (in English) | |
Keyword(1) | vacuum arc deposition |
Keyword(2) | zinc oxide thin film |
Keyword(3) | crystalline and optical properties |
Keyword(4) | electric resistivity |
1st Author's Name | Keisaku Kimura |
1st Author's Affiliation | Department of Electrical and Electronic Engineering Toyohashi University of Technology() |
2nd Author's Name | Ryuichi Miyano |
2nd Author's Affiliation | Department of Electrical and Electronic Engineering Toyohashi University of Technology |
3rd Author's Name | Hirofumi Takikawa |
3rd Author's Affiliation | Department of Electrical and Electronic Engineering Toyohashi University of Technology |
4th Author's Name | Tateki Sakakibara |
4th Author's Affiliation | Department of Electrical and Electronic Engineering Toyohashi University of Technology |
Date | 2000/5/12 |
Paper # | ED2000-29,CPM2000-14,SDM2000-29 |
Volume (vol) | vol.100 |
Number (no) | 58 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |