Presentation | 2000/5/11 Fabrication and Characterization of GaN with buried WN_x contact by ELO Masahiro Haino, Motoo Yamaguchi, Atsushi Motogaito, Hideto Miyake, Kazumasa Hiramatsu, Nobuhiko Sawaki, Yasusi Iyechika, Takayoshi Maeda, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Characterization of W / n-GaN contacts and fabrication of GaN buried with WN_x mask by ELO are carried out. W / n-GaN contacts show good Schottky with increasing evaporation temperature. Annealing of the W / n-GaN contacts were performed. After annealing in H_2, W was decomposed and GaN surface roughened. After annealing in N_2+H_2, W had domain structure like a puzzle and GaN whiskers were observed on the surface. After annealing in NH_3+H_2, W was changed into WN_x. WN_x / n-GaN kept Schottky type. In ELO GaN using WN_x mask, the decomposition of GaN by catalytic effect was restrained, and WN_x buried structure was obtained. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | WN_x / ELO / evaporation temperature / thermal annealing / catalytic effect / Shottky |
Paper # | ED2000-23, CPM2000-8, SDM2000-23 |
Date of Issue |
Conference Information | |
Committee | ED |
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Conference Date | 2000/5/11(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Electron Devices (ED) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Fabrication and Characterization of GaN with buried WN_x contact by ELO |
Sub Title (in English) | |
Keyword(1) | WN_x |
Keyword(2) | ELO |
Keyword(3) | evaporation temperature |
Keyword(4) | thermal annealing |
Keyword(5) | catalytic effect |
Keyword(6) | Shottky |
1st Author's Name | Masahiro Haino |
1st Author's Affiliation | Dept.of Electrical and Electronic Engineering, Mie Univ.() |
2nd Author's Name | Motoo Yamaguchi |
2nd Author's Affiliation | Dept.of Electrical and Electronic Engineering, Mie Univ. |
3rd Author's Name | Atsushi Motogaito |
3rd Author's Affiliation | Dept.of Electrical and Electronic Engineering, Mie Univ. |
4th Author's Name | Hideto Miyake |
4th Author's Affiliation | Dept.of Electrical and Electronic Engineering, Mie Univ. |
5th Author's Name | Kazumasa Hiramatsu |
5th Author's Affiliation | Dept.of Electrical and Electronic Engineering, Mie Univ. |
6th Author's Name | Nobuhiko Sawaki |
6th Author's Affiliation | Dept.of Electronic Engineering, Nagoya Univ. |
7th Author's Name | Yasusi Iyechika |
7th Author's Affiliation | Tukuba Research Laboratory, Sumitomo Chem.Co., Ltd |
8th Author's Name | Takayoshi Maeda |
8th Author's Affiliation | Tukuba Research Laboratory, Sumitomo Chem.Co., Ltd |
Date | 2000/5/11 |
Paper # | ED2000-23, CPM2000-8, SDM2000-23 |
Volume (vol) | vol.100 |
Number (no) | 57 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |