Presentation 2000/5/11
Fabrication and Characterization of GaN with buried WN_x contact by ELO
Masahiro Haino, Motoo Yamaguchi, Atsushi Motogaito, Hideto Miyake, Kazumasa Hiramatsu, Nobuhiko Sawaki, Yasusi Iyechika, Takayoshi Maeda,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) Characterization of W / n-GaN contacts and fabrication of GaN buried with WN_x mask by ELO are carried out. W / n-GaN contacts show good Schottky with increasing evaporation temperature. Annealing of the W / n-GaN contacts were performed. After annealing in H_2, W was decomposed and GaN surface roughened. After annealing in N_2+H_2, W had domain structure like a puzzle and GaN whiskers were observed on the surface. After annealing in NH_3+H_2, W was changed into WN_x. WN_x / n-GaN kept Schottky type. In ELO GaN using WN_x mask, the decomposition of GaN by catalytic effect was restrained, and WN_x buried structure was obtained.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) WN_x / ELO / evaporation temperature / thermal annealing / catalytic effect / Shottky
Paper # ED2000-23, CPM2000-8, SDM2000-23
Date of Issue

Conference Information
Committee ED
Conference Date 2000/5/11(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication and Characterization of GaN with buried WN_x contact by ELO
Sub Title (in English)
Keyword(1) WN_x
Keyword(2) ELO
Keyword(3) evaporation temperature
Keyword(4) thermal annealing
Keyword(5) catalytic effect
Keyword(6) Shottky
1st Author's Name Masahiro Haino
1st Author's Affiliation Dept.of Electrical and Electronic Engineering, Mie Univ.()
2nd Author's Name Motoo Yamaguchi
2nd Author's Affiliation Dept.of Electrical and Electronic Engineering, Mie Univ.
3rd Author's Name Atsushi Motogaito
3rd Author's Affiliation Dept.of Electrical and Electronic Engineering, Mie Univ.
4th Author's Name Hideto Miyake
4th Author's Affiliation Dept.of Electrical and Electronic Engineering, Mie Univ.
5th Author's Name Kazumasa Hiramatsu
5th Author's Affiliation Dept.of Electrical and Electronic Engineering, Mie Univ.
6th Author's Name Nobuhiko Sawaki
6th Author's Affiliation Dept.of Electronic Engineering, Nagoya Univ.
7th Author's Name Yasusi Iyechika
7th Author's Affiliation Tukuba Research Laboratory, Sumitomo Chem.Co., Ltd
8th Author's Name Takayoshi Maeda
8th Author's Affiliation Tukuba Research Laboratory, Sumitomo Chem.Co., Ltd
Date 2000/5/11
Paper # ED2000-23, CPM2000-8, SDM2000-23
Volume (vol) vol.100
Number (no) 57
Page pp.pp.-
#Pages 6
Date of Issue