Presentation | 2000/5/11 Photoluminescence properties of Eu implanted GaN Yasuo Nakanishi, Akihiro Wakahara, Akira Yoshida, Takeshi Ohshima, Hisayoshi Itoh, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Eu is implanted into GaN epitaxial layer. The Eu-implanted GaN films are annealed in NH_3 diluted with N_2 at the temperature range of 950-1100゜C to remove the implantation damage. Photoluminescence(PL)properties are measured in the temperature range of 80-280K by using He-Cd laser as an excitation source. Strong emisssion at 621 nm, corresponding to the transition from ^5D_0 to ^7F_2 states of Eu^<3+> is observed and the thermal quenching properties of the PL is investigated. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Eu doped GaN / Ion implantation / Photoluminescence |
Paper # | ED2000-16, CPM2000-1, SDM2000-16 |
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Committee | ED |
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Conference Date | 2000/5/11(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Electron Devices (ED) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Photoluminescence properties of Eu implanted GaN |
Sub Title (in English) | |
Keyword(1) | Eu doped GaN |
Keyword(2) | Ion implantation |
Keyword(3) | Photoluminescence |
1st Author's Name | Yasuo Nakanishi |
1st Author's Affiliation | Toyohashi University of Technology() |
2nd Author's Name | Akihiro Wakahara |
2nd Author's Affiliation | Toyohashi University of Technology |
3rd Author's Name | Akira Yoshida |
3rd Author's Affiliation | Toyohashi University of Technology |
4th Author's Name | Takeshi Ohshima |
4th Author's Affiliation | Japan Atomic Energy Research Institute |
5th Author's Name | Hisayoshi Itoh |
5th Author's Affiliation | Japan Atomic Energy Research Institute |
Date | 2000/5/11 |
Paper # | ED2000-16, CPM2000-1, SDM2000-16 |
Volume (vol) | vol.100 |
Number (no) | 57 |
Page | pp.pp.- |
#Pages | 4 |
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