Presentation 2000/5/11
Photoluminescence properties of Eu implanted GaN
Yasuo Nakanishi, Akihiro Wakahara, Akira Yoshida, Takeshi Ohshima, Hisayoshi Itoh,
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Abstract(in English) Eu is implanted into GaN epitaxial layer. The Eu-implanted GaN films are annealed in NH_3 diluted with N_2 at the temperature range of 950-1100゜C to remove the implantation damage. Photoluminescence(PL)properties are measured in the temperature range of 80-280K by using He-Cd laser as an excitation source. Strong emisssion at 621 nm, corresponding to the transition from ^5D_0 to ^7F_2 states of Eu^<3+> is observed and the thermal quenching properties of the PL is investigated.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Eu doped GaN / Ion implantation / Photoluminescence
Paper # ED2000-16, CPM2000-1, SDM2000-16
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Committee ED
Conference Date 2000/5/11(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Photoluminescence properties of Eu implanted GaN
Sub Title (in English)
Keyword(1) Eu doped GaN
Keyword(2) Ion implantation
Keyword(3) Photoluminescence
1st Author's Name Yasuo Nakanishi
1st Author's Affiliation Toyohashi University of Technology()
2nd Author's Name Akihiro Wakahara
2nd Author's Affiliation Toyohashi University of Technology
3rd Author's Name Akira Yoshida
3rd Author's Affiliation Toyohashi University of Technology
4th Author's Name Takeshi Ohshima
4th Author's Affiliation Japan Atomic Energy Research Institute
5th Author's Name Hisayoshi Itoh
5th Author's Affiliation Japan Atomic Energy Research Institute
Date 2000/5/11
Paper # ED2000-16, CPM2000-1, SDM2000-16
Volume (vol) vol.100
Number (no) 57
Page pp.pp.-
#Pages 4
Date of Issue