Presentation | 2000/7/21 Electrical properties and interfacial reaction in Cu/n-InP contact Mayumi B. TAKEYAMA, Junichi ITAI, Atsushi NOYA, Tamotsu HASHIZUME, Seiya KASAI, Hideki HASEGAWA, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | The relationship between the electrical property and the interfacial reaction in the Cu/n-InP contact has been studied. Auger electron spectroscopy(AES) and X-ray photoelectron spectroscopy(XPS) analyses showed the existence of distinct phases at the Cu/InP interface in the as-deposited specimen, due to the nonuniform interfacial reaction. The nonuniform reaction at the interface results in the existence of multi barrier heights in the I-V characteristic of the Cu/InP contact. It is revealed that the formation of the uniform interlayer at the electrode/InP interface is crucial to obtain the excellent electrical property of the contact. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | metal-semiconductor interface / InP / electrical property / interfacial reaction / barrier height |
Paper # | ED2000-104 |
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Committee | ED |
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Conference Date | 2000/7/21(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Electron Devices (ED) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Electrical properties and interfacial reaction in Cu/n-InP contact |
Sub Title (in English) | |
Keyword(1) | metal-semiconductor interface |
Keyword(2) | InP |
Keyword(3) | electrical property |
Keyword(4) | interfacial reaction |
Keyword(5) | barrier height |
1st Author's Name | Mayumi B. TAKEYAMA |
1st Author's Affiliation | Dept.of Electrical and Electronic Engineering, Kitami Institute of Technology() |
2nd Author's Name | Junichi ITAI |
2nd Author's Affiliation | Dept.of Electrical and Electronic Engineering, Kitami Institute of Technology |
3rd Author's Name | Atsushi NOYA |
3rd Author's Affiliation | Dept.of Electrical and Electronic Engineering, Kitami Institute of Technology |
4th Author's Name | Tamotsu HASHIZUME |
4th Author's Affiliation | Research Center for Interface Quantum Electronics, Hokkaido University |
5th Author's Name | Seiya KASAI |
5th Author's Affiliation | Graduate School Electronics and Information Engineering, Hokkaido University |
6th Author's Name | Hideki HASEGAWA |
6th Author's Affiliation | Research Center for Interface Quantum Electronics, Hokkaido University |
Date | 2000/7/21 |
Paper # | ED2000-104 |
Volume (vol) | vol.100 |
Number (no) | 236 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |