Presentation 2000/7/21
The passivation effects of V coulumn elements(Bi, Sb)on InP
Shinya Morikita, Hideaki Ikoma,
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Abstract(in English) The passivation effects of V column elements(Bi, Sb)on InP were investigated. The reverse leakage current of the Schottky diode was very low and barrier height was rather high when the thicknesses of the Bi and Sb layers were appropriate(4-6nm), suggesting the robust passivation effects of these layers on InP. As these Bi-and Sb-passivated InP substrates were oxidized in the magnetically-excited plasma, very uniform Bi_2O_3/InP and Sb_2O_3/InP structures were obtained. The capacitance-voltage characteristics were relatively good for these structures. The effect of the forming gas annealing will be discussed.
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Keyword(in English) magnetically excited / InP / Sb / Bi / passivation / barrier height
Paper # ED2000-101
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Committee ED
Conference Date 2000/7/21(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) The passivation effects of V coulumn elements(Bi, Sb)on InP
Sub Title (in English)
Keyword(1) magnetically excited
Keyword(2) InP
Keyword(3) Sb
Keyword(4) Bi
Keyword(5) passivation
Keyword(6) barrier height
1st Author's Name Shinya Morikita
1st Author's Affiliation Department of Electrical Engineering, Faculty of Science and Technology, Science University of Tokyo()
2nd Author's Name Hideaki Ikoma
2nd Author's Affiliation Department of Electrical Engineering, Faculty of Science and Technology, Science University of Tokyo
Date 2000/7/21
Paper # ED2000-101
Volume (vol) vol.100
Number (no) 236
Page pp.pp.-
#Pages 8
Date of Issue