Presentation 2000/6/23
ED2000-89 / SDM2000-89 A SiRF Switch MMIC for the Cellular Frequency Band Using SOI-CMOS Technology
Atsushi Kanda, Masahiro Muraguchi,
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Abstract(in English) A CMOS single-pole-double-throw (SPDT) switch MMIC with 0.7-dB insertion loss and more than 30-dB isolation at 2 GHz is demonstrated using silicon-on-insulator (SOI) technology on a high-resistivity Si substrate. The performance is comparable to that of the commercially available GaAs SPDT switch, and the MMIC can be fabricated in the standard CMOS LSI process.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Switch / SOI / High-Resistivity Substrate / CMOS / Microwave / Cellular
Paper # ED2000-89,SDM2000-89
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Committee ED
Conference Date 2000/6/23(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) ED2000-89 / SDM2000-89 A SiRF Switch MMIC for the Cellular Frequency Band Using SOI-CMOS Technology
Sub Title (in English)
Keyword(1) Switch
Keyword(2) SOI
Keyword(3) High-Resistivity Substrate
Keyword(4) CMOS
Keyword(5) Microwave
Keyword(6) Cellular
1st Author's Name Atsushi Kanda
1st Author's Affiliation NTT Photonics Laboratories()
2nd Author's Name Masahiro Muraguchi
2nd Author's Affiliation NTT Electronics Corporation
Date 2000/6/23
Paper # ED2000-89,SDM2000-89
Volume (vol) vol.100
Number (no) 149
Page pp.pp.-
#Pages 5
Date of Issue