Presentation | 2000/6/23 ED2000-89 / SDM2000-89 A SiRF Switch MMIC for the Cellular Frequency Band Using SOI-CMOS Technology Atsushi Kanda, Masahiro Muraguchi, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | A CMOS single-pole-double-throw (SPDT) switch MMIC with 0.7-dB insertion loss and more than 30-dB isolation at 2 GHz is demonstrated using silicon-on-insulator (SOI) technology on a high-resistivity Si substrate. The performance is comparable to that of the commercially available GaAs SPDT switch, and the MMIC can be fabricated in the standard CMOS LSI process. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Switch / SOI / High-Resistivity Substrate / CMOS / Microwave / Cellular |
Paper # | ED2000-89,SDM2000-89 |
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Conference Information | |
Committee | ED |
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Conference Date | 2000/6/23(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Electron Devices (ED) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | ED2000-89 / SDM2000-89 A SiRF Switch MMIC for the Cellular Frequency Band Using SOI-CMOS Technology |
Sub Title (in English) | |
Keyword(1) | Switch |
Keyword(2) | SOI |
Keyword(3) | High-Resistivity Substrate |
Keyword(4) | CMOS |
Keyword(5) | Microwave |
Keyword(6) | Cellular |
1st Author's Name | Atsushi Kanda |
1st Author's Affiliation | NTT Photonics Laboratories() |
2nd Author's Name | Masahiro Muraguchi |
2nd Author's Affiliation | NTT Electronics Corporation |
Date | 2000/6/23 |
Paper # | ED2000-89,SDM2000-89 |
Volume (vol) | vol.100 |
Number (no) | 149 |
Page | pp.pp.- |
#Pages | 5 |
Date of Issue |