Presentation 2000/6/23
ED2000-84 / SDM2000-84 Characterization of semiconductor structures in the VUV wavelength range using spectroscopic ellipsometry and spectroscopic photometry.
Pierre BOHER, Jean Philippe PIEL, Patrick EVRARD, Christophe DEFRANOUX, Jean Louis STEHLE,
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Abstract(in English) A new generation of spectroscopic ellipsometer capable to work down to 145nm is presented. Included in a purged glove box to reduce the oxygen and water contamination in the part per million ranges, the system can make spectroscopic ellipsometry and spectroscopic photomerty in the wavelength range 145-700nm. Including a premonochromator in the polarizer arm to avoid photo bleaching, the optical setup works in rotating analyzer configuration to minimize the parastic polarization. Experimental results on different kinds of materials for the microelectronics are presented.
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Keyword(in English) Spectroscopic ellipsometry / photometry / VUV / semiconductors
Paper # ED2000-84,SDM2000-84
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Committee ED
Conference Date 2000/6/23(1days)
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Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) ED2000-84 / SDM2000-84 Characterization of semiconductor structures in the VUV wavelength range using spectroscopic ellipsometry and spectroscopic photometry.
Sub Title (in English)
Keyword(1) Spectroscopic ellipsometry
Keyword(2) photometry
Keyword(3) VUV
Keyword(4) semiconductors
1st Author's Name Pierre BOHER
1st Author's Affiliation SOPRA()
2nd Author's Name Jean Philippe PIEL
2nd Author's Affiliation SOPRA
3rd Author's Name Patrick EVRARD
3rd Author's Affiliation SOPRA
4th Author's Name Christophe DEFRANOUX
4th Author's Affiliation SOPRA
5th Author's Name Jean Louis STEHLE
5th Author's Affiliation SOPRA
Date 2000/6/23
Paper # ED2000-84,SDM2000-84
Volume (vol) vol.100
Number (no) 149
Page pp.pp.-
#Pages 6
Date of Issue