Presentation 2000/6/23
ED2000-81 / SDM2000-81 A 4 kV SiC Epitaxial PN Junction Diode with a Low On-resistance
K. Fujihira, S. Tamura, T. Kimoto, H. Matsunami,
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Abstract(in English) The 31 μm thick n^- and p-type epilayers were grown by horizontal cold-wall CVD with nitrogen and aluminum doping, respectively. The diode exhibited a very high breakdown voltage of 4.2 kV with a low on-resistance of 4.6mΩcm^2. This on-resistance is one-order-of-magnitude lower than that of a Si PIN diode with a similar breakdown voltage. The fabricated SiC PN diode showed fast switching with a turn-off time of 0.35μsec.
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Keyword(in English) SiC / PN junction diode / Power device / On-resistance
Paper # ED2000-81,SDM2000-81
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Committee ED
Conference Date 2000/6/23(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) ED2000-81 / SDM2000-81 A 4 kV SiC Epitaxial PN Junction Diode with a Low On-resistance
Sub Title (in English)
Keyword(1) SiC
Keyword(2) PN junction diode
Keyword(3) Power device
Keyword(4) On-resistance
1st Author's Name K. Fujihira
1st Author's Affiliation Department of Electronic Science and Engineering, Kyoto University()
2nd Author's Name S. Tamura
2nd Author's Affiliation Department of Electronic Science and Engineering, Kyoto University
3rd Author's Name T. Kimoto
3rd Author's Affiliation Department of Electronic Science and Engineering, Kyoto University
4th Author's Name H. Matsunami
4th Author's Affiliation Department of Electronic Science and Engineering, Kyoto University
Date 2000/6/23
Paper # ED2000-81,SDM2000-81
Volume (vol) vol.100
Number (no) 149
Page pp.pp.-
#Pages 6
Date of Issue