Presentation 1999/7/22
Optical Proximity Correction Using Diffused Aerial Image Model
Hee-Bom Kim, Chang-Nam Ahn, Ji-Suk Hong, Hyoung-Soon Yune, Yung-Mo Koo, Ki-Ho Baik,
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Abstract(in English) The simulation model which can be applied to correct optical proximity effect has to accurately predict the CD's for various patterns in shape and size within an acceptable computational time budget and with an easiness to calibrate parameters from experimental data. In this respect we compared the simulation results using the DAIM(Diffused Aerial Image Model) with experimental data for three types of patterns (line/space, isolated line and isolated space) with respect to their linearity. We found that DAIM has fine accuracy without any penalty in computational speed and also offers simplicity in analysis. We also found that the mask error effect becomes very significant as the pattern size gets smaller and thus makes the OPC (Optical Proximity Effect Correction) less effective.
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Paper # ED99-100
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Committee ED
Conference Date 1999/7/22(1days)
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Language ENG
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Title (in English) Optical Proximity Correction Using Diffused Aerial Image Model
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1st Author's Name Hee-Bom Kim
1st Author's Affiliation Semiconductor Research Division, Hyundai Electronics Industries Co., Ltd.()
2nd Author's Name Chang-Nam Ahn
2nd Author's Affiliation Semiconductor Research Division, Hyundai Electronics Industries Co., Ltd.
3rd Author's Name Ji-Suk Hong
3rd Author's Affiliation Semiconductor Research Division, Hyundai Electronics Industries Co., Ltd.
4th Author's Name Hyoung-Soon Yune
4th Author's Affiliation Semiconductor Research Division, Hyundai Electronics Industries Co., Ltd.
5th Author's Name Yung-Mo Koo
5th Author's Affiliation Semiconductor Research Division, Hyundai Electronics Industries Co., Ltd.
6th Author's Name Ki-Ho Baik
6th Author's Affiliation Semiconductor Research Division, Hyundai Electronics Industries Co., Ltd.
Date 1999/7/22
Paper # ED99-100
Volume (vol) vol.99
Number (no) 229
Page pp.pp.-
#Pages 7
Date of Issue