Presentation | 1999/7/22 Sub-100nm Lithographic Performance of Novel Electron Beam Resist Sung-Eun Hong, Chi-Hyeong Roh, Jae-Chang Jung, Jae-Yong Ahn, Hyeong-Soo Kim, Ki-Ho Baik, |
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Abstract(in Japanese) | (See Japanese page) |
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Paper # | ED99-99 |
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Committee | ED |
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Conference Date | 1999/7/22(1days) |
Place (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Electron Devices (ED) |
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Language | ENG |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Sub-100nm Lithographic Performance of Novel Electron Beam Resist |
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1st Author's Name | Sung-Eun Hong |
1st Author's Affiliation | Semiconductor Advanced Research Division, Hyundai Electronics Industries Co., Ltd.() |
2nd Author's Name | Chi-Hyeong Roh |
2nd Author's Affiliation | Semiconductor Advanced Research Division, Hyundai Electronics Industries Co., Ltd. |
3rd Author's Name | Jae-Chang Jung |
3rd Author's Affiliation | Semiconductor Advanced Research Division, Hyundai Electronics Industries Co., Ltd. |
4th Author's Name | Jae-Yong Ahn |
4th Author's Affiliation | Semiconductor Advanced Research Division, Hyundai Electronics Industries Co., Ltd. |
5th Author's Name | Hyeong-Soo Kim |
5th Author's Affiliation | Semiconductor Advanced Research Division, Hyundai Electronics Industries Co., Ltd. |
6th Author's Name | Ki-Ho Baik |
6th Author's Affiliation | Semiconductor Advanced Research Division, Hyundai Electronics Industries Co., Ltd. |
Date | 1999/7/22 |
Paper # | ED99-99 |
Volume (vol) | vol.99 |
Number (no) | 229 |
Page | pp.pp.- |
#Pages | 6 |
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