Presentation 1999/7/22
Sub-100nm Lithographic Performance of Novel Electron Beam Resist
Sung-Eun Hong, Chi-Hyeong Roh, Jae-Chang Jung, Jae-Yong Ahn, Hyeong-Soo Kim, Ki-Ho Baik,
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Paper # ED99-99
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Committee ED
Conference Date 1999/7/22(1days)
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Language ENG
Title (in Japanese) (See Japanese page)
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Title (in English) Sub-100nm Lithographic Performance of Novel Electron Beam Resist
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1st Author's Name Sung-Eun Hong
1st Author's Affiliation Semiconductor Advanced Research Division, Hyundai Electronics Industries Co., Ltd.()
2nd Author's Name Chi-Hyeong Roh
2nd Author's Affiliation Semiconductor Advanced Research Division, Hyundai Electronics Industries Co., Ltd.
3rd Author's Name Jae-Chang Jung
3rd Author's Affiliation Semiconductor Advanced Research Division, Hyundai Electronics Industries Co., Ltd.
4th Author's Name Jae-Yong Ahn
4th Author's Affiliation Semiconductor Advanced Research Division, Hyundai Electronics Industries Co., Ltd.
5th Author's Name Hyeong-Soo Kim
5th Author's Affiliation Semiconductor Advanced Research Division, Hyundai Electronics Industries Co., Ltd.
6th Author's Name Ki-Ho Baik
6th Author's Affiliation Semiconductor Advanced Research Division, Hyundai Electronics Industries Co., Ltd.
Date 1999/7/22
Paper # ED99-99
Volume (vol) vol.99
Number (no) 229
Page pp.pp.-
#Pages 6
Date of Issue