| Presentation | 1999/7/22 40nm Electron Beam Patterning by Optimization of Digitizing Method and Post Exposure Bake and its Application to Silicon Nano-Fabrication Sangyeon Han, Taejun Park, Bonkee Kim, Hyungcheol Shin, Kwyro Lee, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We experimented on the 40nm paterning using E-beam lithography system. SAL601 negative E-beam resist was used for this experiment. In order to utilize the maximum ability of E-beam system, we reduced the PR thickness to 100nm, and the field size to 200μm. Then, PEB(Post Expose Bake) time and temperature, which is one of the very important factors for nano-patterning, were reduced for minimum line width. In addition, digitizing was optimized for better results. Quantum wire and quantum dot which can be used for nano-scale memory device, such as single electron memory device, were fabricated using these developed lithography technique. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | E-beam / SAL601 / Field size / PEB / digitizing method / nano-structure |
| Paper # | ED99-94 |
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| Conference Information | |
| Committee | ED |
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| Conference Date | 1999/7/22(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Electron Devices (ED) |
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| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | 40nm Electron Beam Patterning by Optimization of Digitizing Method and Post Exposure Bake and its Application to Silicon Nano-Fabrication |
| Sub Title (in English) | |
| Keyword(1) | E-beam |
| Keyword(2) | SAL601 |
| Keyword(3) | Field size |
| Keyword(4) | PEB |
| Keyword(5) | digitizing method |
| Keyword(6) | nano-structure |
| 1st Author's Name | Sangyeon Han |
| 1st Author's Affiliation | Department of Electrical Engineering, KAIST() |
| 2nd Author's Name | Taejun Park |
| 2nd Author's Affiliation | Department of Electrical Engineering, KAIST |
| 3rd Author's Name | Bonkee Kim |
| 3rd Author's Affiliation | Department of Electrical Engineering, KAIST |
| 4th Author's Name | Hyungcheol Shin |
| 4th Author's Affiliation | Department of Electrical Engineering, KAIST |
| 5th Author's Name | Kwyro Lee |
| 5th Author's Affiliation | Department of Electrical Engineering, KAIST |
| Date | 1999/7/22 |
| Paper # | ED99-94 |
| Volume (vol) | vol.99 |
| Number (no) | 229 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |