Presentation | 1999/7/22 Optical Lithography for Sub-100nm Technology Ki-Ho Baik, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Optical lithography has driven by the miniaturisation of semiconductor devices and has been accompanied by an increase in wafer productivity and performance through the reduction of the IC image geometries. In the last three decades, DRAMs (Dynamic Random Access Memories) have been quadrupling in level of integration every three-year and even two year in recently. Optical lithography has been thriving thanks to evolution of optics and the other peripheral technology innovation. Optical lithography looks like never ending story for the semiconductors industry. The next century lithography will still be dominated by the optical lithography, such as 157nm and EUV. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Optical lithography / 248nm / 193nm / 157nm / E-beam / EUV / Photoresist |
Paper # | ED99-93 |
Date of Issue |
Conference Information | |
Committee | ED |
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Conference Date | 1999/7/22(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
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Chair | |
Vice Chair | |
Secretary | |
Assistant |
Paper Information | |
Registration To | Electron Devices (ED) |
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Language | ENG |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Optical Lithography for Sub-100nm Technology |
Sub Title (in English) | |
Keyword(1) | Optical lithography |
Keyword(2) | 248nm |
Keyword(3) | 193nm |
Keyword(4) | 157nm |
Keyword(5) | E-beam |
Keyword(6) | EUV |
Keyword(7) | Photoresist |
1st Author's Name | Ki-Ho Baik |
1st Author's Affiliation | Memory R&D Division, Hyundai Electronics Industries Co. Lid.() |
Date | 1999/7/22 |
Paper # | ED99-93 |
Volume (vol) | vol.99 |
Number (no) | 229 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |