Presentation 1999/7/22
Optical Lithography for Sub-100nm Technology
Ki-Ho Baik,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Optical lithography has driven by the miniaturisation of semiconductor devices and has been accompanied by an increase in wafer productivity and performance through the reduction of the IC image geometries. In the last three decades, DRAMs (Dynamic Random Access Memories) have been quadrupling in level of integration every three-year and even two year in recently. Optical lithography has been thriving thanks to evolution of optics and the other peripheral technology innovation. Optical lithography looks like never ending story for the semiconductors industry. The next century lithography will still be dominated by the optical lithography, such as 157nm and EUV.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Optical lithography / 248nm / 193nm / 157nm / E-beam / EUV / Photoresist
Paper # ED99-93
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Conference Information
Committee ED
Conference Date 1999/7/22(1days)
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Registration To Electron Devices (ED)
Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Optical Lithography for Sub-100nm Technology
Sub Title (in English)
Keyword(1) Optical lithography
Keyword(2) 248nm
Keyword(3) 193nm
Keyword(4) 157nm
Keyword(5) E-beam
Keyword(6) EUV
Keyword(7) Photoresist
1st Author's Name Ki-Ho Baik
1st Author's Affiliation Memory R&D Division, Hyundai Electronics Industries Co. Lid.()
Date 1999/7/22
Paper # ED99-93
Volume (vol) vol.99
Number (no) 229
Page pp.pp.-
#Pages 6
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