Presentation 1999/6/25
Ultra-thin-film CMOS/SIMOX device technology for low power LSIs
Yasuhiro Sato,
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Abstract(in English) CMOS/SOL (Silicon on Insulator) is very promising for the component of low power LSIs. Fully depleted devices have an ideal subthreshold slope, and thus they can realize the lower power LSIs. The technologies to suppress floating body effects and to reduce source/drain parasitic resistance, both are serious problems in FD devices, are described in this paper. Performance of test LSIs consisting of FD devices are also described.
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Keyword(in English) SIMOX / SOI / LSI / fully-depleted device / floating body effects / parasitic resistance
Paper # ED99-77
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Committee ED
Conference Date 1999/6/25(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Ultra-thin-film CMOS/SIMOX device technology for low power LSIs
Sub Title (in English)
Keyword(1) SIMOX
Keyword(2) SOI
Keyword(3) LSI
Keyword(4) fully-depleted device
Keyword(5) floating body effects
Keyword(6) parasitic resistance
1st Author's Name Yasuhiro Sato
1st Author's Affiliation NTT Telecommunications Energy Laboratories()
Date 1999/6/25
Paper # ED99-77
Volume (vol) vol.99
Number (no) 146
Page pp.pp.-
#Pages 8
Date of Issue