Presentation 1999/4/22
Large Schottky barriers for p-GaN contacts
Kenji Shiojima, Tomoya Sugahara, Shiro Sakai,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Large Schottky barriers were measured for Ni contacts formed on low Mg-doped p-GaN.In order to improve 1eaky Schottky characteristics, 1ow-Mg-doping was examined. This provided atomically-flat suffaces and 1ow dislocation density of 5.5 X10^8 cm^-2. The Schottky barrier height (qφB ) as high as 2.4+0.2 eV and n va1ues of 1.84+0.06 were obtained from current-voltage measurements. These resu1ts are in good agreement with the prediction that the sum of qφs of n and p types adds up to the band gap. In the capacitance-voltage measurements, a transient response of capaditance was observed. This indicates that the eva1uation of deep 1evels close to the va1ence band is possible, which could result in improvement of p-GaN growth.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) p-GaN / metal/semiconductor contrt / Schottky barrier height / low Mg doping
Paper # ED99-3
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Committee ED
Conference Date 1999/4/22(1days)
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Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Large Schottky barriers for p-GaN contacts
Sub Title (in English)
Keyword(1) p-GaN
Keyword(2) metal/semiconductor contrt
Keyword(3) Schottky barrier height
Keyword(4) low Mg doping
1st Author's Name Kenji Shiojima
1st Author's Affiliation NTT Photonics Labofatories()
2nd Author's Name Tomoya Sugahara
2nd Author's Affiliation Department of Electrical and Electronic Engineering, Tokushima University
3rd Author's Name Shiro Sakai
3rd Author's Affiliation Department of Electrical and Electronic Engineering, Tokushima University
Date 1999/4/22
Paper # ED99-3
Volume (vol) vol.99
Number (no) 21
Page pp.pp.-
#Pages 6
Date of Issue