| Presentation | 1994/5/19 Preparation and characterization of Zn,ZnO thin film by VUV- excited chemical vapor deposition Hideyuki Okabe, Shinji Ikeda, Koji Maeda, Akira Yoshida, |
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| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Recently,ZnO films have gained attention as transparent electrodes in many kinds of optoelectronic devices.ZnO films are preferable,because of low cost and high chemical stability, compared with SnO_2,In_2O_3 and ITO films.In this study,we have deposited ZnO films on Si substrates by VUV-excited CVD at room temperature.DEZN and O_2 were used as source gases.As a light source we used Undulator Radiation from UVSOR facility and ArF excimer laser.The composition of the films was determined from XPS spectra.Increasing theO_2, DEZn ratio,we observed the increase of oxygen component and Zn-O bond in the film.The behavior of the oxygen in the films from UR-enhanced CVD is sharply dependent on the intro-duced gas ratio,suggesting a different deposition process between the two processes:ArF excimer laser-induced and UR- enhanced processes. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | VUV-excited CVD / Undulator radiation / excimer laser / room temperature / XPS / DEZn |
| Paper # | ED94-12,CPM94-13 |
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| Conference Information | |
| Committee | ED |
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| Conference Date | 1994/5/19(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Electron Devices (ED) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Preparation and characterization of Zn,ZnO thin film by VUV- excited chemical vapor deposition |
| Sub Title (in English) | |
| Keyword(1) | VUV-excited CVD |
| Keyword(2) | Undulator radiation |
| Keyword(3) | excimer laser |
| Keyword(4) | room temperature |
| Keyword(5) | XPS |
| Keyword(6) | DEZn |
| 1st Author's Name | Hideyuki Okabe |
| 1st Author's Affiliation | Faculty of engineering,Toyohashi University of Technology() |
| 2nd Author's Name | Shinji Ikeda |
| 2nd Author's Affiliation | Faculty of engineering,Toyohashi University of Technology |
| 3rd Author's Name | Koji Maeda |
| 3rd Author's Affiliation | Faculty of engineering,Toyohashi University of Technology |
| 4th Author's Name | Akira Yoshida |
| 4th Author's Affiliation | Faculty of engineering,Toyohashi University of Technology |
| Date | 1994/5/19 |
| Paper # | ED94-12,CPM94-13 |
| Volume (vol) | vol.94 |
| Number (no) | 46 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |