Presentation 1994/10/11
Control of GaAs Schottky Barrier Height by Si Interface Control Layer and its Application for Quntum Structures
Seiya Kasai, Syo-ichi Uno, Tamotsu Hashizume, Hideki Hasegawa,
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Abstract(in English) Control of GaAs Schottky barrier heights by Si Interface Control Layer(Si ICL)was attempted.It was shown that Si ICL makes it possible to control the barrier height over the range of 300meV with suitable ICL thickness and doping into the ICL. To control the Schottky barrier height spatially at quantum structures,FIB technique was investigated.FIB-induced interface state gave the Schottky barrier height change in the range of 290meV.This indicates the possibility of control Schottky barrier heights in nano-meter scale.
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Keyword(in English) Si ICL / GaAs / Schottky barrier / Interface state / Quantum potential / FIB
Paper # ED94-78
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Committee ED
Conference Date 1994/10/11(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Control of GaAs Schottky Barrier Height by Si Interface Control Layer and its Application for Quntum Structures
Sub Title (in English)
Keyword(1) Si ICL
Keyword(2) GaAs
Keyword(3) Schottky barrier
Keyword(4) Interface state
Keyword(5) Quantum potential
Keyword(6) FIB
1st Author's Name Seiya Kasai
1st Author's Affiliation Faculty of Engineering,Hokkaido University()
2nd Author's Name Syo-ichi Uno
2nd Author's Affiliation Faculty of Engineering,Hokkaido University
3rd Author's Name Tamotsu Hashizume
3rd Author's Affiliation Faculty of Engineering,Hokkaido University
4th Author's Name Hideki Hasegawa
4th Author's Affiliation Research Center for Interface Quntum Electronics,Faculty of Engineering,Hokkaido University
Date 1994/10/11
Paper # ED94-78
Volume (vol) vol.94
Number (no) 268
Page pp.pp.-
#Pages 8
Date of Issue