Presentation | 1994/10/11 Highly strained InGaAs channel HEMTs on GaAs substrates grown by MBE Makoto Kudou, Tomoyoshi Mishima, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Highly strained InGaAs layers grown by MBE are investigated using photoluminescence and hall measurements for improving the performance of pseudomorphic HEMTS.At a low growth temperature of 400℃ at which In surface segregation is reduced,the In mole fracti on exceeds 0.30 without degmrading crystalline quality of InGaAs layers.A relatively thin 6-nm channel is thick enough to obtain high mobility and high sheet electron concentration by increasing the In composition.The highly strained In_xGa^1-x>As channel HEMTs(0.3【less than or equal】x【less than or equal】0.4)show supe rior transconductance over conventional In_0.25>Ga_0.75>As channel HEMTS. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | strained InGaAs layers / MBE / HEMTs / surface segregation / In composition |
Paper # | ED94-75 |
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Conference Information | |
Committee | ED |
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Conference Date | 1994/10/11(1days) |
Place (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Electron Devices (ED) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Highly strained InGaAs channel HEMTs on GaAs substrates grown by MBE |
Sub Title (in English) | |
Keyword(1) | strained InGaAs layers |
Keyword(2) | MBE |
Keyword(3) | HEMTs |
Keyword(4) | surface segregation |
Keyword(5) | In composition |
1st Author's Name | Makoto Kudou |
1st Author's Affiliation | Central Research Laboratory,Hitachi,Ltd.() |
2nd Author's Name | Tomoyoshi Mishima |
2nd Author's Affiliation | Central Research Laboratory,Hitachi,Ltd. |
Date | 1994/10/11 |
Paper # | ED94-75 |
Volume (vol) | vol.94 |
Number (no) | 268 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |