Presentation 1994/10/11
Highly strained InGaAs channel HEMTs on GaAs substrates grown by MBE
Makoto Kudou, Tomoyoshi Mishima,
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Abstract(in English) Highly strained InGaAs layers grown by MBE are investigated using photoluminescence and hall measurements for improving the performance of pseudomorphic HEMTS.At a low growth temperature of 400℃ at which In surface segregation is reduced,the In mole fracti on exceeds 0.30 without degmrading crystalline quality of InGaAs layers.A relatively thin 6-nm channel is thick enough to obtain high mobility and high sheet electron concentration by increasing the In composition.The highly strained In_xGa^1-x>As channel HEMTs(0.3【less than or equal】x【less than or equal】0.4)show supe rior transconductance over conventional In_0.25>Ga_0.75>As channel HEMTS.
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Keyword(in English) strained InGaAs layers / MBE / HEMTs / surface segregation / In composition
Paper # ED94-75
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Committee ED
Conference Date 1994/10/11(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
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Title (in English) Highly strained InGaAs channel HEMTs on GaAs substrates grown by MBE
Sub Title (in English)
Keyword(1) strained InGaAs layers
Keyword(2) MBE
Keyword(3) HEMTs
Keyword(4) surface segregation
Keyword(5) In composition
1st Author's Name Makoto Kudou
1st Author's Affiliation Central Research Laboratory,Hitachi,Ltd.()
2nd Author's Name Tomoyoshi Mishima
2nd Author's Affiliation Central Research Laboratory,Hitachi,Ltd.
Date 1994/10/11
Paper # ED94-75
Volume (vol) vol.94
Number (no) 268
Page pp.pp.-
#Pages 6
Date of Issue