Presentation 1994/10/11
0.1-μm Au/WSiN Gate GaAs MESFET's Having new BP-LDD structure
Kazumi Nishimura, Masami Tokumitsu, Makoto Hirano, Shinji Aoyama, Yasuro Yamane, Kimiyoshi Yamasaki,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) A new Au, WSiN self-aligned gate GaAs MESFET structure having 0. 1-μm gate length has been developed.In order to suppress the short channel effects,this device has twostep buried players,not only for the n and n'layers but also for the n^+-layer(BP2).Using sidewall Au electroplating technology,the gate resistance has been successfully reduced.The maximum transconductance of 720 mS/mm,the maximum f_T of 105 GHz and the maximum fmax of 233 GHz have been demonstrated.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) WSiN / GaAs / BP-LDD structure / MESFET / Sidewall electroplating technology
Paper # ED94-71
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Committee ED
Conference Date 1994/10/11(1days)
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Paper Information
Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) 0.1-μm Au/WSiN Gate GaAs MESFET's Having new BP-LDD structure
Sub Title (in English)
Keyword(1) WSiN
Keyword(2) GaAs
Keyword(3) BP-LDD structure
Keyword(4) MESFET
Keyword(5) Sidewall electroplating technology
1st Author's Name Kazumi Nishimura
1st Author's Affiliation LSI Laboratories,NTT()
2nd Author's Name Masami Tokumitsu
2nd Author's Affiliation LSI Laboratories,NTT
3rd Author's Name Makoto Hirano
3rd Author's Affiliation LSI Laboratories,NTT
4th Author's Name Shinji Aoyama
4th Author's Affiliation LSI Laboratories,NTT
5th Author's Name Yasuro Yamane
5th Author's Affiliation LSI Laboratories,NTT
6th Author's Name Kimiyoshi Yamasaki
6th Author's Affiliation LSI Laboratories,NTT
Date 1994/10/11
Paper # ED94-71
Volume (vol) vol.94
Number (no) 268
Page pp.pp.-
#Pages 6
Date of Issue