Presentation 1994/10/11
Modulation of FET Operation by Carrier Trapping at the WSi/GaAs Shottky Contacts
Ryo Hattori, Takako Kitamura, Kazuhiko Sato, Osamu Ishihara,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) We have found a way to improve the thermal stability of GaAs, InGaP Schottky contacts by using WSiN with low N content for the Schottky metal.When N content is 10% or less,TEM observation reveals that minroscopic interaction is completly supressed.As a result,a WSiN/GaAs CAP/InGaP Schottky contact shows thermal stabiliy after annealing of 800C for 100 min.even though the GaAs cap is as thin as 25A.We also found that a double layered structure,WSiN(N=37%)/WSiN(N=10%),shows good annealing performance.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GaAs / WSiN / N content / double layered structure / Schottky contact
Paper # ED94-67
Date of Issue

Conference Information
Committee ED
Conference Date 1994/10/11(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Modulation of FET Operation by Carrier Trapping at the WSi/GaAs Shottky Contacts
Sub Title (in English)
Keyword(1) GaAs
Keyword(2) WSiN
Keyword(3) N content
Keyword(4) double layered structure
Keyword(5) Schottky contact
1st Author's Name Ryo Hattori
1st Author's Affiliation Mitsubishi Electric Corporation()
2nd Author's Name Takako Kitamura
2nd Author's Affiliation Mitsubishi Electric Corporation
3rd Author's Name Kazuhiko Sato
3rd Author's Affiliation Mitsubishi Electric Corporation
4th Author's Name Osamu Ishihara
4th Author's Affiliation Mitsubishi Electric Corporation
Date 1994/10/11
Paper # ED94-67
Volume (vol) vol.94
Number (no) 268
Page pp.pp.-
#Pages 6
Date of Issue