Presentation 1994/9/14
TCAD-based Generation of Circuit Model-Parameters for 0.4μm CMOS P rocess Technology
Hisaaki Kunitomo, Kimiko Aoyama, Katsumi Tsuneno, Hisako Sato, Takahide Nakamura, Hiroo Masuda,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) To achieve concurrent design of process and circuit for next - generation 0.4um CMOS, DRAM,predictive process design and MOS model - parameter generation have been conducted based - on process and device simulations.A couple of tens simulations and gloval calibrations based on process and device data - base successfully provide reliable and accurate prediction in device performance.A set of channel - length dependent MOS model parameters were determined with reasonable accuracy for 0.4um CNOS circuit design without TEG fabrication.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) circuit model-parameter / worst condition / channel-length dependent
Paper # ED94-65,SDM94-102,VLD94-62
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Committee ED
Conference Date 1994/9/14(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) TCAD-based Generation of Circuit Model-Parameters for 0.4μm CMOS P rocess Technology
Sub Title (in English)
Keyword(1) circuit model-parameter
Keyword(2) worst condition
Keyword(3) channel-length dependent
1st Author's Name Hisaaki Kunitomo
1st Author's Affiliation Microcomputer System,Hitachi()
2nd Author's Name Kimiko Aoyama
2nd Author's Affiliation Device Development Center,Hitachi
3rd Author's Name Katsumi Tsuneno
3rd Author's Affiliation Device Development Center,Hitachi
4th Author's Name Hisako Sato
4th Author's Affiliation Device Development Center,Hitachi
5th Author's Name Takahide Nakamura
5th Author's Affiliation Device Development Center,Hitachi
6th Author's Name Hiroo Masuda
6th Author's Affiliation Device Development Center,Hitachi
Date 1994/9/14
Paper # ED94-65,SDM94-102,VLD94-62
Volume (vol) vol.94
Number (no) 231
Page pp.pp.-
#Pages 7
Date of Issue