Presentation 1999/2/16
Electrical Properties of Ferroelectric Bi_4Ti_3O_<12> Film Grown on Si Substrate
Takeshi KIJIMA,
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Abstract(in English) Pt/Bi_2Si0_5/Si(MIS) and Pt/200-nm-Bi_4Ti_3O_<12>/Pt/30-nm-Bi_2SiO_5/Si(Metal/Ferroelectric/Metal/Insulator/Semiconductor) structures were prepared by MOCVD method. When the capacitance-vs-voitage(C-V) characteristics of the Pt/Bi_2SiO_5/Si structure was measured, the inversion layer formation could be confirmed by the electron of the minor career. On the other hand, the C-V characteristics of Pt/Bi_4Ti_3O_<12>/Pt/Bi_2SiO_5/Si structure has ferroelectric switching property, and the memory window was about 2.0V. Further more, it is shown that the capacitance at zero-bias shows almost constant for 24 h.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) MFMIS-FET / ferroelectric memory / Bi_4Ti_3O_<12> / bismuth silicate / Bi_2SiO_5 / MOCVD method
Paper # ED98-254
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Committee ED
Conference Date 1999/2/16(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Electrical Properties of Ferroelectric Bi_4Ti_3O_<12> Film Grown on Si Substrate
Sub Title (in English)
Keyword(1) MFMIS-FET
Keyword(2) ferroelectric memory
Keyword(3) Bi_4Ti_3O_<12>
Keyword(4) bismuth silicate
Keyword(5) Bi_2SiO_5
Keyword(6) MOCVD method
1st Author's Name Takeshi KIJIMA
1st Author's Affiliation Functional Devices Laboratories, SHARP Corporation()
Date 1999/2/16
Paper # ED98-254
Volume (vol) vol.98
Number (no) 591
Page pp.pp.-
#Pages 7
Date of Issue