Presentation 1999/2/15
A Study on SrBi_2Ta_2O_9 Thin Films Prepared by Sol-Gel Method using Steam-curing Process
Yoshihiro Sawada, Hideya Kobari, Yoshimi Sato, Akira Hashimoto, Ichiro Koiwa, Hiroyo Kato, Tetsuya Osaka,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) In recent years, SrBi_2Ta_2O_9 (SBT) thin films have been receiving attention as fatigue-free ferroelectric materials and research is quite active in this area. We have been developing our original hydrolyzed sol-gel coating solutions the molecular structures of which we can control by applying hydrolysis. We studied the SBT thin film forming process using these coating solutions with the steam curing process used together and observed lowering temperature of crystallization the improvement of crystal orientation.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) SrBi_2Ta_2O_9 (SBT) / hydrolysis / sol-gel method / metalloxane bond / Steam cure
Paper # ED98-240
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Committee ED
Conference Date 1999/2/15(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) A Study on SrBi_2Ta_2O_9 Thin Films Prepared by Sol-Gel Method using Steam-curing Process
Sub Title (in English)
Keyword(1) SrBi_2Ta_2O_9 (SBT)
Keyword(2) hydrolysis
Keyword(3) sol-gel method
Keyword(4) metalloxane bond
Keyword(5) Steam cure
1st Author's Name Yoshihiro Sawada
1st Author's Affiliation Specialty Development Division 1, Research & Development Department, Tokyo Ohka Kogyo Co., Ltd.()
2nd Author's Name Hideya Kobari
2nd Author's Affiliation Specialty Development Division 1, Research & Development Department, Tokyo Ohka Kogyo Co., Ltd.
3rd Author's Name Yoshimi Sato
3rd Author's Affiliation Specialty Development Division 1, Research & Development Department, Tokyo Ohka Kogyo Co., Ltd.
4th Author's Name Akira Hashimoto
4th Author's Affiliation Specialty Development Division 1, Research & Development Department, Tokyo Ohka Kogyo Co., Ltd.
5th Author's Name Ichiro Koiwa
5th Author's Affiliation Semiconductor Technology Laboratory, Research & Development Group, Oki Electric Industry Co., Ltd.
6th Author's Name Hiroyo Kato
6th Author's Affiliation Semiconductor Technology Laboratory, Research & Development Group, Oki Electric Industry Co., Ltd.
7th Author's Name Tetsuya Osaka
7th Author's Affiliation School of Science and Engineering, Waseda University
Date 1999/2/15
Paper # ED98-240
Volume (vol) vol.98
Number (no) 590
Page pp.pp.-
#Pages 6
Date of Issue