Presentation 1999/1/22
Low Volatge Operation Power Heterojunction FET with Low on-resistance for Personal Digital Cellular Phones
Takehiko Kato, Yasunori Bito, Naotaka Iwata,
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Abstract(in English) This paper describes excellent 1.0V operatiion power performance of a double doped AlGaAs/InGaAs/AlGaAs heterojunction FET(HJFET)for Personal Digital Cellular Phones. A low on-resistance of a power FET is key issue for a high output power and a high efficiency. The developed FET with a multilayer cap consisting of a highly Si-doped AlGaAs and narrow recessed structure exhibited an on-resistance of 1.3Ω・mm and a maximum drain current of 620mA/mm. A 28mm gate-periphery device operating with a drain bias voltage of 1.0V demonstrated an output power of 1.0W, an associated gain of 13.7dB and a power-added efficiency of 59% with an adjacent channel leakage power at 50kHz off-center frequency of -48dBc.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) mobile communication handset / power device / on-resistance / low voltage operation / Heterojunction FEt
Paper # ED98-215,MW98-178,ICD98-282
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Committee ED
Conference Date 1999/1/22(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Low Volatge Operation Power Heterojunction FET with Low on-resistance for Personal Digital Cellular Phones
Sub Title (in English)
Keyword(1) mobile communication handset
Keyword(2) power device
Keyword(3) on-resistance
Keyword(4) low voltage operation
Keyword(5) Heterojunction FEt
1st Author's Name Takehiko Kato
1st Author's Affiliation Kansai Electronics Research Laboratories, NEC Corporation()
2nd Author's Name Yasunori Bito
2nd Author's Affiliation Kansai Electronics Research Laboratories, NEC Corporation
3rd Author's Name Naotaka Iwata
3rd Author's Affiliation Kansai Electronics Research Laboratories, NEC Corporation
Date 1999/1/22
Paper # ED98-215,MW98-178,ICD98-282
Volume (vol) vol.98
Number (no) 519
Page pp.pp.-
#Pages 6
Date of Issue