Presentation 1998/7/21
Fabrication of the Metal dot array by Electrochemical Process
Taketomo SATO, Chinami KANESHIRO, Hiroshi OKADA, Hideki HASEGAWA,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) Pt dot arrays were formed on n-GaAs by combining the electrochemical process with the electron-beam(EB) lithoghography. In order to define dot positions, dot-array windows were patterned on GaAs by EB lithography. It is possible to form the metal particles on only the opened areas of EB patterned substrates, thereby realizing precise dot-positions control. In this study, Pt particles with a diameter of 20nm could be formed in the center of each naked GaAs surface patterned with a period of 200nm. In the measurements by the AFM system with conductive probes, I-V characteristics of each Pt dots/n-GaAs contact showed rectifying behavior due to Schottky barrier formation.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) electrochemical process / metal dot / Pt / GaAs / SEM / AFM / I-V
Paper # ED98-79
Date of Issue

Conference Information
Committee ED
Conference Date 1998/7/21(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication of the Metal dot array by Electrochemical Process
Sub Title (in English)
Keyword(1) electrochemical process
Keyword(2) metal dot
Keyword(3) Pt
Keyword(4) GaAs
Keyword(5) SEM
Keyword(6) AFM
Keyword(7) I-V
1st Author's Name Taketomo SATO
1st Author's Affiliation Graduate School of Electronics and Information Engineering and Research Center for Interface Quantum Electronics, Hokkaido University()
2nd Author's Name Chinami KANESHIRO
2nd Author's Affiliation Graduate School of Electronics and Information Engineering and Research Center for Interface Quantum Electronics, Hokkaido University
3rd Author's Name Hiroshi OKADA
3rd Author's Affiliation Graduate School of Electronics and Information Engineering and Research Center for Interface Quantum Electronics, Hokkaido University
4th Author's Name Hideki HASEGAWA
4th Author's Affiliation Graduate School of Electronics and Information Engineering and Research Center for Interface Quantum Electronics, Hokkaido University
Date 1998/7/21
Paper # ED98-79
Volume (vol) vol.98
Number (no) 184
Page pp.pp.-
#Pages 6
Date of Issue