| Presentation | 1998/5/22 Relation between OSF induced by B Ion lmplantation and Gate Oxide Reliability Kenji Nakashima, Yukihiko Watanabe, Hirofumi Funabashi, Tomoyuki Yoshida, Yasuichi Mitsushima, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Effects of ion implantation, interstitial oxygen concentration, and heat treatment after ion implantation on the formation of OSFs induced by B ion implantation were investigated. The OSFs were formed during oxidation when interstitial oxygen coexisted with B ion implantation defects, and the density of the OSFs increased with oxygen concentration. From these results, it is found that B ion implantation defects form oxygen precipitates which acts as nuclei for OSFs. In addition, the relation between the OSFs induced by B ion implantation and gate oxide reliability was investigated. The degradation of the oxide reliability was found to corelate with the OSFs formation. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | boron / ion implantation / OSF / interstitial oxygen concentration / oxide / reliability |
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| Conference Information | |
| Committee | ED |
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| Conference Date | 1998/5/22(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Registration To | Electron Devices (ED) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Relation between OSF induced by B Ion lmplantation and Gate Oxide Reliability |
| Sub Title (in English) | |
| Keyword(1) | boron |
| Keyword(2) | ion implantation |
| Keyword(3) | OSF |
| Keyword(4) | interstitial oxygen concentration |
| Keyword(5) | oxide |
| Keyword(6) | reliability |
| 1st Author's Name | Kenji Nakashima |
| 1st Author's Affiliation | TOYOTA Central R&D Labs., Inc.() |
| 2nd Author's Name | Yukihiko Watanabe |
| 2nd Author's Affiliation | TOYOTA Central R&D Labs., Inc. |
| 3rd Author's Name | Hirofumi Funabashi |
| 3rd Author's Affiliation | TOYOTA Central R&D Labs., Inc. |
| 4th Author's Name | Tomoyuki Yoshida |
| 4th Author's Affiliation | TOYOTA Central R&D Labs., Inc. |
| 5th Author's Name | Yasuichi Mitsushima |
| 5th Author's Affiliation | TOYOTA Central R&D Labs., Inc. |
| Date | 1998/5/22 |
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| Volume (vol) | vol.98 |
| Number (no) | 60 |
| Page | pp.pp.- |
| #Pages | 6 |
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